Optical properties of nanostructured WO3 thin films by GLancing Angle Deposition: Comparison between experiment and simulation

Charles, Cédric; Martin, Nicolas; Devel, M.

doi:10.1016/j.surfcoat.2015.06.051

Cited by 19 publications

(11 citation statements)

References 41 publications

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“…The latter becomes increasingly elliptical (more precisely crescent-shaped) as deposition continues and an anisotropic structure is produced. Such structural anisotropy has also been reported for other GLAD films [21,34] and occurs for incident angles higher than 60°. Columns are connected to each other by chains, perpendicular to the plane of incidence [35].…”

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confidence: 81%

Electrical resistivity and elastic wave propagation anisotropy in glancing angle deposited tungsten and gold thin films

Beainou

Chargui

Pedrosa

et al. 2019

Applied Surface Science

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We report on experimental investigations of electrical resistivity and surface elastic wave propagation in W and Au thin films sputter-deposited by glancing angle deposition. For both metals, the angle of deposition  is systematically changed from 0 to 85°. Dense and compact films are produced with a normal incident angle  = 0°, whereas inclined and porous columnar architectures are clearly obtained for the highest angles. Group velocities and DC electrical resistivities of W and Au films are significantly changed in x and y directions as  increases from 0 to 85°. Isotropic behaviors are always observed for Au films, whereas anisotropic velocity and resistivity are clearly measured in W films prepared with incident angles higher than 60°. The anisotropic coefficient reaches 1.8 for velocity and 2.0 for resistivity in W films, while it remains in-between 1.0-1.2 in Au films whatever the incident angle. This directional dependence of electrical resistivity and elastic wave propagation is connected to the anisotropic structural characteristics of W inclined columns (fanning of their cross-section), while Au columns exhibit a more symmetric growth as a function of the incident angle.

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confidence: 81%

Electrical resistivity and elastic wave propagation anisotropy in glancing angle deposited tungsten and gold thin films

Beainou

Chargui

Pedrosa

et al. 2019

Applied Surface Science

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“…Among these strategies, growth of thin films by vacuum processes, such as magnetron sputtering by the GLAD technique (GLancing Angle Deposition), recently became a very motivating way to create original architectures (tilted columns, zigzags, spirals, etc. [13][14][15][16]) and thus, to develop anisotropic properties [17][18][19]. However, some scientific and technological challenges are still to be addressed, such as the tunability of anisotropic characteristics and understanding the correlations between created structures and propagation of waves, electrons, ions, or temperature through these structured thin films.…”

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confidence: 99%

Influence of Thickness and Sputtering Pressure on Electrical Resistivity and Elastic Wave Propagation in Oriented Columnar Tungsten Thin Films

et al. 2020

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Tungsten films were prepared by DC magnetron sputtering using glancing angle deposition with a constant deposition angle α = 80°. A first series of films was obtained at a constant pressure of 4.0 × 10−3 mbar with the films’ thickness increasing from 50 to 1000 nm. A second series was produced with a constant thickness of 400 nm, whereas the pressure was gradually changed from 2.5 × 10−3 to 15 × 10−3 mbar. The A15 β phase exhibiting a poor crystallinity was favored at high pressure and for the thinner films, whereas the bcc α phase prevailed at low pressure and for the thicker ones. The tilt angle of the columnar microstructure and fanning of their cross-section were tuned as a function of the pressure and film thickness. Electrical resistivity and surface elastic wave velocity exhibited the highest anisotropic behaviors for the thickest films and the lowest pressure. These asymmetric electrical and elastic properties were directly connected to the anisotropic structural characteristics of tungsten films. They became particularly significant for thicknesses higher than 450 nm and when sputtered particles were mainly ballistic (low pressures). Electronic transport properties, as well as elastic wave propagation, are discussed considering the porous architecture changes vs. film thickness and pressure.

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“…Nanocolumnar porous thin films deposited at oblique geometries are nowadays receiving much attention due to their unique morphological features and remarkable properties . While their high specific surface can be exploited for the development of gas or liquid sensor devices, the possibility to fine tune their density and connectivity among pores make them also suitable for other applications in technological fields such as biomedicine, plasmonics, microfluidics, batteries, or photonics, among others . In all these cases, the relevant specific features of the nanocolumnar structures (e.g., their size, tilt, average distance, anisotropic distributions, preferential direction of coalescence, etc.)…”

Section: Introductionmentioning

confidence: 99%

Growth of nanocolumnar thin films on patterned substrates at oblique angles

García-Valenzuela

Muñoz‐Piña

Alcalá

et al. 2018

Plasma Processes & Polymers

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The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well-established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has been defined, below which the columnar growth is modulated by the substrate topography, while for thicknesses above, the impact of substrate features is progressively lost in two stages; first columns grown on taller features take over neighboring ones, and later the film morphology evolves independently of substrate features. These results have been experimentally tested by analyzing the nanocolumnar growth of SiO 2 thin films on ioninduced patterned substrates. K E Y W O R D S magnetron sputtering, nanostructures, oblique angle deposition, patterned substrate, thin films Plasma Process Polym. 2019;16:e1800135.www.plasma-polymers.com

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Optical properties of nanostructured WO3 thin films by GLancing Angle Deposition: Comparison between experiment and simulation

Cited by 19 publications

References 41 publications

Electrical resistivity and elastic wave propagation anisotropy in glancing angle deposited tungsten and gold thin films

Electrical resistivity and elastic wave propagation anisotropy in glancing angle deposited tungsten and gold thin films

Influence of Thickness and Sputtering Pressure on Electrical Resistivity and Elastic Wave Propagation in Oriented Columnar Tungsten Thin Films

Growth of nanocolumnar thin films on patterned substrates at oblique angles

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