2006
DOI: 10.1016/j.jnoncrysol.2006.01.074
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Optical properties of microcrystalline 3C–SiC:H films measured by resonant photothermal bending spectroscopy

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Cited by 10 publications
(7 citation statements)
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References 9 publications
(19 reference statements)
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“…Because of the aptitude of the hot wire chemical vapour deposition (HWCVD) to avail a high density of H radicals, crucial for nanocrystalline growth, this deposition has been used by many groups to produce nanocrystalline SiC at temperatures below 400 °C using monomethyl-silane (MMS) [3][4][5][6]. In this study we employed a SiH 4 /CH 4 /H 2 mixture to deposit amorphous silicon carbide (a-SiC:H) by HWCVD at a substrate temperature of 380 °C.…”
mentioning
confidence: 99%
“…Because of the aptitude of the hot wire chemical vapour deposition (HWCVD) to avail a high density of H radicals, crucial for nanocrystalline growth, this deposition has been used by many groups to produce nanocrystalline SiC at temperatures below 400 °C using monomethyl-silane (MMS) [3][4][5][6]. In this study we employed a SiH 4 /CH 4 /H 2 mixture to deposit amorphous silicon carbide (a-SiC:H) by HWCVD at a substrate temperature of 380 °C.…”
mentioning
confidence: 99%
“…In this study, resonant-type PBS (resonant-PBS) [22][23][24][25] was employed for improving the sensitivity. Figure 1 shows a schematic illustration of the resonant-PBS system.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…During PECVD under hydrogen dilution, hydrogen carriers can reduce the density of defect states at the surface. 16 However, fabrication under hydrogen dilution usually requires a high substrate temperature and RF plasma power. [17][18][19] Under hydrogen-free PECVD, nonstoichiometric Si-rich Si x C 1Àx can be synthesized at low substrate temperatures, considerably enhancing its absorption coefficient.…”
Section: Introductionmentioning
confidence: 99%