“…These nanotextured black silicon (NBSi) wafers also have good antireflection (AR) properties over a broad range of incident angles. − These AR characteristics are mainly attributed to the omnidirectional scattering of light, which is caused by the subwavelength structures and refractive index gradient from the substrate to air. − Therefore, NBSi has been rapidly applied to a variety of solar cells, ,− including thin-film cells, − photoelectrochemical cells, , diffused pn junction cells, − and solid-state hybrid heterojunction cells . Many NBSi fabrication processes have been developed, such as stain etching, electrochemical etching, reactive-ion etching, , laser treatments, , metal-assisted wet chemical etching, ,,,− and the Fray–Farthing–Chen Cambridge process, , all of which have been comprehensively and clearly reviewed by Liu et al Of these methods, metal-assisted wet chemical etching benefits from a simple hardware requirement as well as being a cost-effective, fast, and applicable process for the fabrication of such nanostructures. In addition, this technique can be implemented not only on crystalline, multicrystalline, and amorphous Si , but also on other materials .…”