2013
DOI: 10.1063/1.4803152
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Optical properties of “black silicon” formed by catalytic etching of Au/Si(100) wafers

Abstract: Influence of catalytic gold and silver metal nanoparticles on structural, optical, and vibrational properties of silicon nanowires synthesized by metal-assisted chemical etching J. Appl. Phys. 112, 073509 (2012); 10.1063/1.4757009Silicon structuring by etching with liquid chlorine and fluorine precursors using femtosecond laser pulses

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Cited by 15 publications
(13 citation statements)
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References 59 publications
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“…The morphologies of the resulting silicon surfaces can be controlled by varying the process parameters, such as the size, shape and surface coverage of noble metal nanoparticles, etchant concentration and the etching time. 103 This etching technique can be applied to c-Si, mc-Si, and amorphous Si (a-Si), 104,105 as well as other materials, such as GaAs, GaN, and SiC. 92 It has grown increasingly popular over the last decade, especially in a research context, and remains as a mainstream etching method.…”
Section: Metal-assisted Chemical Etchingmentioning
confidence: 99%
“…The morphologies of the resulting silicon surfaces can be controlled by varying the process parameters, such as the size, shape and surface coverage of noble metal nanoparticles, etchant concentration and the etching time. 103 This etching technique can be applied to c-Si, mc-Si, and amorphous Si (a-Si), 104,105 as well as other materials, such as GaAs, GaN, and SiC. 92 It has grown increasingly popular over the last decade, especially in a research context, and remains as a mainstream etching method.…”
Section: Metal-assisted Chemical Etchingmentioning
confidence: 99%
“…These nanotextured black silicon (NBSi) wafers also have good antireflection (AR) properties over a broad range of incident angles. These AR characteristics are mainly attributed to the omnidirectional scattering of light, which is caused by the subwavelength structures and refractive index gradient from the substrate to air. Therefore, NBSi has been rapidly applied to a variety of solar cells, , including thin-film cells, photoelectrochemical cells, , diffused pn junction cells, and solid-state hybrid heterojunction cells . Many NBSi fabrication processes have been developed, such as stain etching, electrochemical etching, reactive-ion etching, , laser treatments, , metal-assisted wet chemical etching, ,,, and the Fray–Farthing–Chen Cambridge process, , all of which have been comprehensively and clearly reviewed by Liu et al Of these methods, metal-assisted wet chemical etching benefits from a simple hardware requirement as well as being a cost-effective, fast, and applicable process for the fabrication of such nanostructures. In addition, this technique can be implemented not only on crystalline, multicrystalline, and amorphous Si , but also on other materials .…”
Section: Introductionmentioning
confidence: 99%
“…The effective refractive index of B-Si is lower than that of c-Si and the extinction coefficient is higher when compared to c-Si. 29 This is expected, as the reflectance is very low and the transmittance is also lower than that of c-Si, leading to very high absorptance in B-Si. The simulated reflectance of B-Si is generally in accord with the experimentally obtained reflectance of B-Si.…”
Section: Discussionmentioning
confidence: 88%