2021
DOI: 10.1063/5.0068829
|View full text |Cite
|
Sign up to set email alerts
|

Optical properties, band structures, and phase transition of UO2+x epitaxial films deposited by polymer-assisted deposition

Abstract: Optical properties of the UO2+x film deposited by a polymer-assisted deposition method have been investigated by spectroscopic ellipsometry (SE). This epitaxial film contains at least two kinds of uranium oxides of U3O8 and UO3, and the O/U ratio is 2.74, which is confirmed by x-ray diffraction (XRD) and scanning Auger microscopy methods. By investigating the optical constants, the bandgaps of U3O8 and UO3 are determined as 2.3 and 1.0 eV, respectively, and 80% of the epitaxial film is U3O8 and 20% is UO3. The… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
3
0

Year Published

2022
2022
2023
2023

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(3 citation statements)
references
References 20 publications
0
3
0
Order By: Relevance
“…We are aware of five references to the experimental measurement of the band gap in U 3 O 8 [39,40,[52][53][54]. The values vary considerably, but the consensus appears to be E g = 1.8 ± 0.2 eV.…”
Section: Spin Free Statesmentioning
confidence: 99%
“…We are aware of five references to the experimental measurement of the band gap in U 3 O 8 [39,40,[52][53][54]. The values vary considerably, but the consensus appears to be E g = 1.8 ± 0.2 eV.…”
Section: Spin Free Statesmentioning
confidence: 99%
“…Their contribution also includes growth on several different substrates using magnetron sputtering. Further advances in this field since then include reactive sputtering on LSAT (110) [61, 62], magnetron sputtering on YSZ (100) [63], DC sputtering on SrTiO 3 (110) [64], PAD of UO 2+x by Zhang et al [65], and spin coat combustion on aluminum sheets by Roach et al [66]. U x Th 1−x O 2 thin film synthesis was achieved by Cakir et al to study surface reduction using ice [67].…”
Section: Thin Film Synthesismentioning
confidence: 99%
“…Their contribution also includes growth on several different substrates using magnetron sputtering. Further advances in this field since then include reactive sputtering on LSAT (110) [53,54], magnetron sputtering on YSZ(100) [55], DC sputtering on SrTiO 3 (110) [56], PAD of UO 2+x by Zhang et al [57], and spin coat combustion on aluminum sheets by Roach et al [58]. U x Th 1−x O 2 thin film synthesis was achieved by Cakir et alto study surface reduction using ice [59].…”
Section: A Thin Film Synthesismentioning
confidence: 99%