Optical properties and mechanical stress in SiO2/Nb2O5 multilayers

Richter, Frank; Küpfer, H.; Schlott, P.; Geßner, Thomas; Kaufmann, Ch.

doi:10.1016/s0040-6090(01)00864-1

Cited by 67 publications

(24 citation statements)

References 12 publications

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“…Up to now, studies on the optical properties of niobium oxides were almost focused on their reflectance and refractive index properties [13][14][15][16]. In this paper, we report an interesting photoluminescence property of an amorphous NbO x thin film and its synthesis by a thermal oxidation method.…”

mentioning

confidence: 91%

Photoluminescence of amorphous niobium oxide films synthesized by solid-state reaction

Zhou¹,

Li²,

Wang³

et al. 2008

Thin Solid Films

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mentioning

confidence: 91%

Photoluminescence of amorphous niobium oxide films synthesized by solid-state reaction

Zhou¹,

Li²,

Wang³

et al. 2008

Thin Solid Films

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“…In recent years, Nb 2 O 5 films have attained considerable interest for electrochromic (EC) devices because of their crystal-structure-dependent electrochromic properties. The optical and structural properties of Nb 2 O 5 films depend strongly on stoichiometry, crystal structure, and surface roughness [1][2][3][4][5][6][7][8]. Therefore, it is necessary to research the role of deposition and post-deposition parameters on the film properties.…”

Section: Introductionmentioning

confidence: 99%

The effects of heat treatment on optical, structural, electrochromic and bonding properties of Nb2O5 thin films

Coşkun

Demirel

Atak

2015

Journal of Alloys and Compounds

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“…Therefore an appropriate sequencing of the layers of suitable dielectric materials and their thicknesses is critical for achieving the desired spectral response and application. Therefore, it is important to optimize the coating conditions in the designing process [15,16]. In our previous work, we proposed multilayer dielectric filter based on TiO 2 and SiO 2 materials because of their excellent optical properties [17].…”

Section: Filter Design and Discussionmentioning

confidence: 99%

Multilayer dielectric stack Notch filter for 450-700 nm wavelength spectrum

Butt¹,

Fomchenkov²,

Хонина³

2017

Collection of Selected Papers of the III International Conference on Information Technology and Nanotechnology

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In this work, a multilayer dielectric optical notch filters design is proposed based on TiO 2 and SiO 2 alternating layers. Titanium dioxide (TiO 2 ) is selected for its high refractive index value (2.5) and Silicon dioxide (SiO 2 ) as a low refractive index layer (1.45). These filters are conventionally envisioned for overpowering of powerful laser beams in research experiments, to obtain good signal-to-noise ratios in Raman laser spectroscopy. It is precarious that light from the pump laser should be blocked. This is attained by inserting a notch filter in the detection channel of the setup. In addition to spectroscopy, notch filters are also useful in laser-based florescence instrumentation and biomedical laser systems. The designed filter shows a high quality with an average transmission of more than 90% in 450-535 and 587-700 nm bandwidths. And a stop band region between 536-586 nm shows a transmission of 3% only with an optical density of greater than 3, which makes it a promising element to be used as a notch filter.

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Optical properties and mechanical stress in SiO2/Nb2O5 multilayers

Cited by 67 publications

References 12 publications

Photoluminescence of amorphous niobium oxide films synthesized by solid-state reaction

Photoluminescence of amorphous niobium oxide films synthesized by solid-state reaction

The effects of heat treatment on optical, structural, electrochromic and bonding properties of Nb2O5 thin films

Multilayer dielectric stack Notch filter for 450-700 nm wavelength spectrum

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