Optical Parameters of Oxide Films Typically Used in Optical Coating Production

Tikhonravov, Alexander V.; Trubetskov, Michael K.; Amotchkina, Tatiana V.; DeBell, Gary W.; Pervak, Vladimir; Sytchkova, Anna

doi:10.1364/oic.2010.tha6

Cited by 13 publications

(31 citation statements)

References 2 publications

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“…Refractive indices of Ta 2 O 5 and SiO 2 thin-film materials have been found with a high accuracy and verified using reliable results of the previous studies [17,18]. This allows us to neglect possible small offsets in layer refractive indices and to attribute the observed deviations to errors in layer thicknesses.…”

Section: Reverse Engineering and Re-deposition With Modified Monitorisupporting

confidence: 74%

Design, production and reverse engineering of ultra-steep hot mirrors

Zhang¹,

Tikhonravov²,

Liu³

et al. 2014

Opt. Express

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Abstract:We present the whole design-production chain of an ultra-steep hot mirror produced using the indirect monochromatic monitoring technique. The hot mirror without thin layers is designed utilizing the stochastic optimization procedure that takes in account upper and lower constraints for layer optical thickness. We produced the hot mirror with the ion-assisted electron beam deposition technique using indirect monochromatic monitoring strategy, performed reverse engineering of the deposited coatings, and illustrated that the random variation of the tooling factors in low-index layers is the main factor causing production errors. We modified the monitoring strategy with low-index layers monitored by quartz crystal monitor, and demonstrated the excellent correspondence to the theoretical spectral performance.

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Section: Reverse Engineering and Re-deposition With Modified Monitorisupporting

confidence: 74%

Design, production and reverse engineering of ultra-steep hot mirrors

Zhang¹,

Tikhonravov²,

Liu³

et al. 2014

Opt. Express

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“…Refractive indices n and extinction coefficients χ in Eq. (5) were found in the course of characterization process based on T and R measurements [4,11]. For data processing we used a homogeneous thin film model that incorporates Cauchy formula for n(λ ) and exponential formula for χ(λ ).…”

Section: Total Losses Spectral Behavior In the Case Of Slightly Absormentioning

confidence: 99%

“…Our characterization process is based on the minimization of a standard discrepancy function estimating the closeness between experimental and model spectral characteristics of the investigated sample [4,11,15]. In the course of minimization process, refractive index changes by a value close to that given by Eq.…”

Section: Effect Of Systematic Errors In R and T Data On The Corresponmentioning

confidence: 99%

“…[4] we introduced a concept of characterization approach as a combination of the measurement data, thin film model, and algorithm for data processing. The most popular characterization approach is based on using normal and quasi-normal transmittance (T ) and reflectance (R) spectra of an investigated sample.…”

Section: Introductionmentioning

confidence: 99%

“…This dependence is frequently called total losses (TL) in the investigated thin film sample [4,7]. Typically, in the spectral range where the substrate and the thin film are non-absorbing and non-scattering, one expects zero total losses in the sample.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Oscillations in spectral behavior of total losses (1 − R − T) in thin dielectric films

Amotchkina¹,

Trubetskov²,

Tikhonravov³

et al. 2012

Opt. Express

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Abstract:We explain reasons of oscillations frequently observed in total losses spectra (1 − R − T ) calculated on the basis of measurement spectral photometric data of thin film samples. The first reason of oscillations is related to difference in angles of incidence at which spectral transmittance and reflectance are measured. The second reason is an absorption in a thin film. The third reason is a slight thickness non-uniformity of the film. We observe a good agreement between theoretical models and corresponding measurements, which proves above statements on the origins of oscillations in total losses.

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Improving optical thickness monitoring by including systematic and process-influenced transmittance deviations

et al. 2023

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During optical monitoring using broadband transmittance measurement, the accuracy depends on how both the substrate and the optical path are aligned. We present a correction procedure to improve the accuracy of the monitoring, even if the substrate has features such as absorption or if there is misalignment of the optical path. The substrate in this case can either be a test glass or a product. The algorithm is proven by experimental coatings which were produced with and without the correction. Additionally, the optical monitoring system was also used to perform an in situ quality check. The system allows a detailed spectral analysis of all substrates with a high position resolution. Both plasma and the temperature effects on the central wavelength of a filter are identified. This knowledge enables the optimization of the following runs.

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Optical Parameters of Oxide Films Typically Used in Optical Coating Production

Cited by 13 publications

References 2 publications

Design, production and reverse engineering of ultra-steep hot mirrors

Design, production and reverse engineering of ultra-steep hot mirrors

Oscillations in spectral behavior of total losses (1 − R − T) in thin dielectric films

Improving optical thickness monitoring by including systematic and process-influenced transmittance deviations

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