Optical noncontact method to detect amplitude defects of polymeric objects

Kmec, Jakub; Pavlíček, Pavel; Šmı́d, Petr

doi:10.1016/j.polymertesting.2022.107802

Cited by 2 publications

(2 citation statements)

References 26 publications

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“…An optical noncontact method was used by [89] to detect amplitude defects on transparent polymeric or glass objects. This method employs light with a low degree of spatial and temporal coherence to avoid unwanted interference phenomena originating from the surface coating.…”

Section: Image Preprocessing and Digital Processing: A Comprehensive ...mentioning

confidence: 99%

Ultraviolet Radiation Transmission in Building’s Fenestration: Part II, Exploring Digital Imaging, UV Photography, Image Processing, and Computer Vision Techniques

Onatayo

Srinivasan

Shah³

2023

Buildings

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The growing demand for sustainable and energy-efficient buildings has highlighted the need for reliable and accurate methods to detect fenestration deterioration and assess UV radiation transmission. Traditional detection techniques, such as spectrophotometers and radiometers, discussed in Part I, are often expensive and invasive, necessitating more accessible and cost-effective solutions. This study, which is Part II, provides an in-depth exploration of the concepts and methodologies underlying UV bandpass-filtered imaging, advanced image processing techniques, and the mechanisms of pixel transformation equations. The aim is to lay the groundwork for a unified approach to detecting ultraviolet (UV) radiation transmission in fenestration glazing. By exploiting the capabilities of digital imaging devices, including widely accessible smartphones, and integrating them with robust segmentation techniques and mathematical transformations, this research paves the way for an innovative and potentially democratized approach to UV detection in fenestration glazing. However, further research is required to optimize and tailor the detection methods and approaches using digital imaging, UV photography, image processing, and computer vision for specific applications in the fenestration industry and detecting UV transmission. The complex interplay of various physical phenomena related to UV radiation, digital imaging, and the unique characteristics of fenestration glazing necessitates the development of a cohesive framework that synergizes these techniques while addressing these intricacies. While extensively reviewing existing techniques, this paper highlights these challenges and sets the direction for future research in the UV imaging domain.

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Section: Image Preprocessing and Digital Processing: A Comprehensive ...mentioning

confidence: 99%

Ultraviolet Radiation Transmission in Building’s Fenestration: Part II, Exploring Digital Imaging, UV Photography, Image Processing, and Computer Vision Techniques

Onatayo

Srinivasan

Shah³

2023

Buildings

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“…Phase defects primarily emerge as interlayer irregularities during the deposition of the high-reflective multilayer and can alter the phase of the reflected light by generating top surface defects, attenuating the intensity of the reflected light [12]. Kmec et al found that amplitude defects obstruct both incident and reflected light, creating dark areas on the photomask [13].…”

Section: Introductionmentioning

confidence: 99%

Wet cleaning of Ta-based extreme ultraviolet photomasks at room temperature

Park,

Choi,

Kim

2024

Nanotechnology

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Owing to the wavelength-dependent limits of the deep ultraviolet (DUV) exposure process, the semiconductor industry introduced extreme ultraviolet (EUV) lithography operating at a 13.5-nm wavelength. Traditional photomasks employ pellicles for protection; however, EUV-specific pellicles are not widely applicable to commercial processes, requiring the development of a EUV photomask cleaning method. In this study, a wet cleaning method for Ta-based EUV photomasks at room temperature was systematically examined in terms of key parameters, including the pattern step height, surface topography, and particulate count, via atomic force microscopy and X-ray reflectivity. Post sulfuric acid-hydrogen peroxide mixture (SPM) treatment, the photomask exhibited a stable step height, indicating minimal pattern degradation. Additionally, discernible alterations in the surface roughness and a decrease in particle count were observed, further indicating to the effectiveness of SPM-mediated cleaning. Conversely, following SC-1 treatment, while the pattern step height remained relatively unchanged, a notable increase in surface irregularities and macroscopic particulates was observed, suggesting a suboptimal cleaning efficiency of the SC-1 solution despite its potential for pattern structure preservation. Our room temperature wet cleaning method efficiently reduces wear-out and successfully eliminates contaminants, potentially prolonging the EUV photomask's productivity and durability.

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Optical noncontact method to detect amplitude defects of polymeric objects

Cited by 2 publications

References 26 publications

Ultraviolet Radiation Transmission in Building’s Fenestration: Part II, Exploring Digital Imaging, UV Photography, Image Processing, and Computer Vision Techniques

Ultraviolet Radiation Transmission in Building’s Fenestration: Part II, Exploring Digital Imaging, UV Photography, Image Processing, and Computer Vision Techniques

Wet cleaning of Ta-based extreme ultraviolet photomasks at room temperature

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