Optical glass surfaces polishing by cerium oxide particles

Bouzid, D.; Belkhie, N; Aliouane, Toufik

doi:10.1088/1757-899x/28/1/012007

Cited by 14 publications

(9 citation statements)

References 5 publications

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“…Ceria (CeO 2 )-based materials are widely used in various technological fields, primarily in catalytic applications in the environmental, energy, and hydrogen production fields, 1,2 as abrasives in the glass polishing 3,4 and as biocompatible materials for medical uses. 5−7 All these applications involve either liquid or gaseous water as a reagent, product, solvent, or simply as a moisture influencing (positively or negatively) the final properties and functions of ceria.…”

Section: Introductionmentioning

confidence: 99%

Development and Application of a ReaxFF Reactive Force Field for Cerium Oxide/Water Interfaces

Brugnoli

Menziani

Urata³

et al. 2021

J. Phys. Chem. A

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Ceria (CeO 2 ) is a well-known catalytic oxide with many environmental, energy production, and industrial applications, most of them involving water as a reactant, byproduct, solvent, or simple spectator. In this work, we parameterized a Ce/O/H ReaxFF for the study of ceria and ceria/water interfaces. The parameters were fitted to an ab initio training set obtained at the DFT/PBE0 level, including the structures, cohesive energies, and elastic properties of the crystalline phases Ce, CeO 2 , and Ce 2 O 3 ; the O-defective structures and energies of vacancy formation on CeO 2 bulk and CeO 2 (111) surface, as well as the absorption and reaction energies of H 2 and H 2 O molecules on CeO 2 (111). The new potential reproduced reasonably well all the fitted properties as well as the relative stabilities of the different ceria surfaces, the oxygen vacancies formation, and the energies and structures of associative and dissociative water molecules on them. Molecular dynamics simulations of the liquid water on the CeO 2 (111) and CeO 2 (100) surfaces were carried out to study the coverage and the mechanism of water dissociation. After equilibration, on average, 35% of surface sites of CeO 2 (111) are hydroxylated whereas 15% of them are saturated with molecular water associatively adsorbed. As for the CeO 2 (100) surface, we observed that water preferentially dissociates covering 90% of the available surface sites in excellent agreement with recent experimental findings.

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Section: Introductionmentioning

confidence: 99%

Development and Application of a ReaxFF Reactive Force Field for Cerium Oxide/Water Interfaces

Brugnoli

Menziani

Urata³

et al. 2021

J. Phys. Chem. A

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“…Moreover, clean, smooth, and reproducible sample surfaces are desirable for various surface science studies of materials, e.g., corrosion, adsorption, lm deposition, etc. 8,[12][13][14][15][16] The effect of ceria abrasive slurry consistency in optical glass polishing was investigated by Wang et al who observed that the material removal rate increases with a decrease of the ceria concentration. 8 CMP appears to be the most promising technology in microelectronic fabrication for the planarization of globally complex device topographies.…”

Section: Introductionmentioning

confidence: 99%

“…6 Ceria is the most widely used abrasive for the CMP of silicate glasses, 7 to nish CRT screens, in LCDs and it is extensively used in ophthalmic industry for prescription lens polishing. 8 CMP appears to be the most promising technology in microelectronic fabrication for the planarization of globally complex device topographies. 9 Ceria slurries have stimulated widespread interest because of enhancements in the material removal rate, surface nish, and selectivity over slurries formulated with silica abrasives.…”

Section: Introductionmentioning

confidence: 99%

“…There are only few a published reports on glass polishing using nanostructured ceria in the past couple of decades. 8,[12][13][14][15][16] The effect of ceria abrasive slurry consistency in optical glass polishing was investigated by Wang et al who observed that the material removal rate increases with a decrease of the ceria concentration. 7 A lot of controversy exists around the effect of the particle size and concentration of slurry on polishing.…”

Section: Introductionmentioning

confidence: 99%

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Tailoring the surface properties of cerium oxide nanoabrasives through morphology control for glass CMP

2015

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Nanosized cerium oxide (CeO 2 ) particles possessing different morphologies like nanorods, nanocubes and nanospheres have been successfully synthesized by a simple one step, surfactant free, precipitation technique and by hydrothermal methods. The diverse morphology motifs were further utilized for the planarization of silicate glass with an initial surface roughness of $40 nm and we observed a strong morphology dependence of the abrasive in glass polishing. Polishing efficiency of the nanoabrasives in terms of the mass removal and surface roughness was investigated using a table top lapping machine.Surface roughness analysis by atomic force microscopy reveals that the ceria nanostructure with a mixed morphology of rods and cubes could produce a surface finish of $3Å. The surface properties of the abrasive were found to play a key role in polishing as evidenced by X-ray photoelectron spectroscopy and Raman spectral analysis. The powder contact angle/hydrophilicity of the nanopowders followed the same trend as that of the dipolar (200) plane and [Ce 3+ ]. This work has shown promise in polishing efficiency with nano CeO 2 slurry to achieve nanolevel planarity on glass substrates, which is desirable for the global planarization of complex device topography.

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“…Cerium oxide pellets [8] or soft-magnetic particles with magnetorheological fluid [9] could be used to make the polishing process more effective, yet these technologies can cause trouble in CNC polishing machining. The elastic properties of the pad material change in the polishing time, but they do not have the main influence on the surface quality [10].…”

Section: Introductionmentioning

confidence: 99%

Investigation of Polishing Characteristics for Aspherical Lenses Manufacturing

Kadzevičius

Švagždytė

Gargasas

et al. 2020

mech

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There were used the spherical lenses in industry conventional for long time, but new types of lenses were created during innovation processes. One type of lenses is aspherical. Two main parameters describing quality of aspherical lenses are accuracy of the form shape and surface roughness. These parameters can be obtained after last operation – polishing. Technical parameters that give the biggest influence to form shape and surface roughness were investigated in this experiment and optimal technical parameters for polishing process were established. Melted quartz ,,UVFS” was used in this research, investigations were carried out according by full factorial design. Five axis CNC machine Schneider SCPA100 was used for polishing and profilometer Nanoscan 855 was used for measurements. After analysis of results it was found out that speed of rotation and penetration depth are the most important factors in polishing process. For getting the best shape it’s necessary to use the smallest chosen values of speed of rotation and penetration depth, for getting the best surface roughness polishing parameters changing conversely. The smallest value of surface roughness Rz was 0.06 µm, and shape deviation was 2.6 µm. Optimal polishing parameters for the best quality of aspherical lenses was provided.

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Optical glass surfaces polishing by cerium oxide particles

Cited by 14 publications

References 5 publications

Development and Application of a ReaxFF Reactive Force Field for Cerium Oxide/Water Interfaces

Development and Application of a ReaxFF Reactive Force Field for Cerium Oxide/Water Interfaces

Tailoring the surface properties of cerium oxide nanoabrasives through morphology control for glass CMP

Investigation of Polishing Characteristics for Aspherical Lenses Manufacturing

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