1994
DOI: 10.1364/ao.33.006508
|View full text |Cite
|
Sign up to set email alerts
|

Optical glass polishing by controlled laser surface-heat treatment

Abstract: It is shown that optical surfaces traditionally ground in conventional glasses with high coefficients of thermal expansion may be polished by irradiation with a space- and time-controlled uniform CO(2) laser beam. Comparisons of a theoretical simulation model of the laser-driven heating process with the experimental results allow us to determine the conditions for successful and reliable use of this technique. The technique can be applied indiscriminately to preheated samples made of different glasses, with an… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
22
0
2

Year Published

1999
1999
2023
2023

Publication Types

Select...
6
3

Relationship

0
9

Authors

Journals

citations
Cited by 50 publications
(24 citation statements)
references
References 4 publications
0
22
0
2
Order By: Relevance
“…The angular brackets ... in (14) stands for ensemble average or, what is in most cases equivalent, average over the surface area…”
Section: Persson Theorymentioning
confidence: 99%
“…The angular brackets ... in (14) stands for ensemble average or, what is in most cases equivalent, average over the surface area…”
Section: Persson Theorymentioning
confidence: 99%
“…This was recognized as an efficient way to polish optical surfaces. 1,2 Owing to the surface-minimizing effect of the surface tension, melting of large-scale domains which penetrate considerably into the volume will result in the formation of convex structures. While this behaviour has been successfully employed for the fabrication of convex micro-optical structures, [3][4][5][6] it is undesired in the context of surface polishing.…”
Section: Copyright 2012 Author(s) This Article Is Distributed Under mentioning
confidence: 99%
“…With low irradiation, ablation becomes negligible whereas surface-tension-induced smoothing remains effective. 20 The protocol is sketched in Figure 2. Photoresist (AZ1512HS) is spun onto a flat silica substrate (f) and locally removed by means of standard photolithography in order to expose the underlying silica for a substrate-selective RIE step (CHF 3 /Ar/ O 2 ) (g).…”
mentioning
confidence: 99%