2018
DOI: 10.1134/s0030400x18080143
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Optical Gain of 1550-nm Range Multiple-Quantum-Well Heterostructures and Limiting Modulation Frequencies of Vertical-Cavity Surface-Emitting Lasers Based on Them

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Cited by 10 publications
(4 citation statements)
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“…The active region was the stronglystrained In 0.74 Ga 0.26 As QWs of the thickness of 2.4 nm (the lattice mismatch parameter ∼ 1.4%), separated by the lattice-matched barrier In 0.53 Al 0.16 Ga 0.31 As layers. In order to increase the mode amplification by modification of the longitudinal confinement factor, the number of the wells is increased to 10, while the thickness of the barriers is decreased to 7 nm [15]. As a result, the total strain of the layers of the active region was ∼ 0.36% in relation to the InP substrate material.…”
Section: Experimental Samplesmentioning
confidence: 99%
See 1 more Smart Citation
“…The active region was the stronglystrained In 0.74 Ga 0.26 As QWs of the thickness of 2.4 nm (the lattice mismatch parameter ∼ 1.4%), separated by the lattice-matched barrier In 0.53 Al 0.16 Ga 0.31 As layers. In order to increase the mode amplification by modification of the longitudinal confinement factor, the number of the wells is increased to 10, while the thickness of the barriers is decreased to 7 nm [15]. As a result, the total strain of the layers of the active region was ∼ 0.36% in relation to the InP substrate material.…”
Section: Experimental Samplesmentioning
confidence: 99%
“…In case of application of the InAlGaAs quantum wells as the active region, the maximum modulation bandwidth around 8 GHz has been achieved and the error-free data transmission for 10 km at 10 Gbit/s has been demonstrated in the NRZmodulation mode [14]. For further improvement of the laser high-speed performance we have proposed to used the active region based on the thin strained InGaAs/InAlGaAs quantum wells [15]. In terms of implementation of sharp heterointerfaces, the most preferable option is to apply the molecular beam epitaxy (MBE) technology as it ensures growth control atomically in contrast to the metallo-organic chemical vapor deposition (MOCVD) [16].…”
Section: Introductionmentioning
confidence: 99%
“…Расчет модального усиления G mod проводился аналогично [7]. На пороге лазерной генерации усиление равно сумме всех потерь [8]…”
Section: результаты и обсуждениеunclassified
“…The use of InGaAs QWs instead of InAlGaAs QWs potentially allows one to evade problems associated with the SRH nonradiative recombination of carriers. A reduced barrier thickness combined with an increase in the number of InGaAs QWs [11] provides an opportunity to maintain relatively high (compared to InAlGaAs QWs) values of factor Ŵ z in this case [8,12]. At the same time, it should be noted that the use of ternary InGaAs solid alloys instead of quaternary InAlGaAs ones necessitates a reduction in QW thickness.…”
Section: Introductionmentioning
confidence: 99%