Abstract:A new projection exposure method without using reticles was proposed, and the feasibility of printing arbitrary patterns was investigated. The preparation of expensive reticles is not favorable for the small-volume production of micro-electromechanical systems (MEMS), optomechanical systems, and their components. On the other hand, long turnaround time (TAT) becomes a fatal bottleneck preventing the rapid follow-up of various design changes. As a countermeasure, we previously proposed a new exposure method nam… Show more
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