Optical elements based on silicon photonics

Butt, Muhammad Ali; Хонина, С. Н.; Kazanskiy, Nikolay L.

doi:10.18287/2412-6179-2019-43-6-1079-1083

Cited by 45 publications

(19 citation statements)

References 18 publications

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“…The benefit of the optical approach is that data can be managed at much higher speeds [1]. Fiber-optic communication networks [2], commercial telecommunications [3], military communications [4], and computer-to-computer data communication Materials 2022, 15, 4591 2 of 25 links [5] are some of the general spheres where integrated optics provide performanceboosting advantages [6]. Additional valuable applications are projected in the fields of optical sensing [7,8], optical signal processing [9], and perhaps optical computing [10].…”

Section: Introductionmentioning

confidence: 99%

Optical Thin Films Fabrication Techniques—Towards a Low-Cost Solution for the Integrated Photonic Platform: A Review of the Current Status

et al. 2022

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In the past few decades, several methods concerning optical thin films have been established to facilitate the development of integrated optics. This paper provides a brief depiction of different techniques for implementing optical waveguide thin films that involve chemical, physical, and refractive index modification methods. Recent advances in these fabrication methods are also been presented. Most of the methods developed for the realization of the thin-films are quite efficient, but they are expensive and require sophisticated equipment. The major interest of the scientists is to develop simple and cost-effective methods for mass production of optical thin films resulting in the effective commercialization of the waveguide technology. Our research group is focused on developing a silica-titania optical waveguide platform via the sol-gel dip-coating method and implementing active and passive optical elements via the wet etching method. We are also exploring the possibility of using nanoimprint lithography (NIL) for patterning these films so that the fabrication process is efficient and economical. The recent developments of this platform are discussed. We believe that silica-titania waveguide technology developed via the sol-gel dip-coating method is highly attractive and economical, such that it can be commercialized for applications such as sensing and optical interconnects.

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Section: Introductionmentioning

confidence: 99%

Optical Thin Films Fabrication Techniques—Towards a Low-Cost Solution for the Integrated Photonic Platform: A Review of the Current Status

et al. 2022

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“…The silicon photonics has attracted more attention from researchers in the past few decades [1][2][3][4][5]. This is due to a number of reasons, including the cheaper implementation of optical devices using standard semiconductor manufacturing technologies [2] and miniaturization of solutions for light transmission through optical fibers [3].…”

Section: Introductionmentioning

confidence: 99%

Optical Vortices Sharp Focusing by Silicon Ring Gratings Using High-Performance Computer Systems

Savelyev

2021

Proceedings of CECNet 2021

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The diffraction of vortex laser beams with circular polarization (with different direction of polarization rotation) by silicon ring gratings was investigated in this paper. The silicon diffractive axicons with different numerical apertures (NA) were considered as such ring gratings. The considered diffractive axicons are compared with single silicon circular protrusion (cylinder). The finite difference time domain method was used for Light propagation (3D) through the proposed silicon ring gratings and silicon cylinder. The possibility of subwavelength focusing by varying the height of the elements is demonstrated. In particular, it is numerically shown that a silicon cylinder forms a light spot with the minimum size (intensity) of the longitudinal component of the electric field FWHM is 0.32λ.

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“…Для создания ДОЭ обычно применяется двухстадийная технология с дополнительными металлическими масками [2,15,16]. На первом этапе микрорельеф через слой фоторезиста передается в металлическую пленку, которая становится селективной контактной маской на втором этапе передачи микрорельефа в подложку.…”

Section: Introductionunclassified

Влияние Асимметрии Расположения Металлических Масок На Согласование Нижнего Электрода С Высокочастотным Генератором Смещения При Реактивно-Ионном Травлении Массивных Подложек

Полетаев¹,

Любимов²

2021

Физика И Техника Полупроводников

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The effect of the degree of asymmetry in the arrangement of metal masks on the matching of the lower electrode with a high-frequency displacement generator during selective reactive-ion etching of massive substrates in plasma-forming gas mixtures based on freon-14 is studied theoretically and experimentally. Theoretically, the absence of the influence of the asymmetry of the mask location on the specific reactive power is shown. It is shown that at the edge of the substrate, especially with a mask, there is a sharp increase in the RF current density, which proves mainly the surface (end) nature of its flow. The influence of the mask location on the behavior of the electric charge density, which correlates with the distribution of the RF current density in the near-surface layer of the substrate, is established. No redistribution of the charge density of the chemically active plasma particles at the edge of the mask was detected. In accordance with the theoretical results obtained, it is experimentally shown that metal masks with a side length ratio of 36/0 mm reduce the power reflection coefficient within 5%.

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Optical elements based on silicon photonics

Cited by 45 publications

References 18 publications

Optical Thin Films Fabrication Techniques—Towards a Low-Cost Solution for the Integrated Photonic Platform: A Review of the Current Status

Optical Thin Films Fabrication Techniques—Towards a Low-Cost Solution for the Integrated Photonic Platform: A Review of the Current Status

Optical Vortices Sharp Focusing by Silicon Ring Gratings Using High-Performance Computer Systems

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