Highly anisotropic and ordered nanoscale
lamellar morphologies can be spontaneously generated over macroscopic
areas, without the use of a photomask or any templating agents, via
the photoelectrodeposition of Se–Te alloy films. To form such
structures, the light source can be a single, linearly polarized light
source that need not necessarily be highly coherent. In this work,
the variation in the morphologies produced by this deposition process
was evaluated in response to differences in the coherence and relative
phase between multiple simultaneous linearly polarized illumination
inputs. Specifically, the morphologies of photoelectrodeposits were
evaluated when two tandem same-wavelength sources with discrete linear
polarizations, both either mutually incoherent or mutually coherent
(with defined phase differences), were used. Additionally, morphologies
were simulated via computer modeling of the interfacial light scattering
and absorption during the photoelectrochemical growth process. The
morphologies that were generated using two coherent, in-phase sources
were equivalent to those generated using only a single source. In
contrast, the use of two coherent, out-of-phase sources produced a
range of morphological patterns. For small out-of-phase addition of
orthogonal polarization components, lamellar-type patterns were observed.
When fully out-of-phase orthogonal sources (circular polarization)
were used, an isotropic, mesh-type pattern was instead generated,
similar to that observed when unpolarized illumination was utilized.
In intermediate cases, anisotropic lamellar-type patterns were superimposed
on the isotropic mesh-type patterns, and the relative height between
the two structures scaled with the amount of out-of-phase addition
of the orthogonal polarization components. Similar results were obtained
when two incoherent sources were utilized. In every case, the long
axis of the lamellar-type morphology component aligned parallel to
the intensity-weighted average polarization orientation. The observations
consistently agreed with computer simulations, indicating that the
observed morphologies were fully determined by the nature of the illumination
utilized during the growth process. The collective data thus indicated
that the photoelectrodeposition process exhibits sensitivity toward
the coherency, relative phase, and polarization orientations of all
optical inputs and that this sensitivity is physically expressed in
the morphology of the deposit.