“…6 This material is a n-type semiconductor and has a direct band gap of 3.37 eV at room temperature. 7 Because of its interesting properties, many works were focused on the elaboration of ZnO films by several methods such as magnetron sputtering, 8 molecular beam epitaxy, 9 chemical vapor deposition, 10 pulsed laser deposition (PLD), 11 chemical bath deposition (CBD), 12 spray pyrolysis, 13 solgel, 14 electrochemical deposition, 2 hydrothermal growth 15 and thermal decomposition. 16 Another process to obtain ZnO films is the thermal oxidation of metallic Zn layers which takes advantage of its simplicity of the process.…”