“…11,16,[19][20][21][22][23][24][25] A variety of techniques have been used to study the point defect density as a function of the growth and annealing temperature, including Hall effect, 11 electron paramagnetic resonance, 22 Auger spectroscopy, 16 positron annihilation, 23 and scanning tunneling microscopy. 24,25 These studies have shown that annealing reactions involving defect complexes of As Ga , As i , and V Ga promote the diffusion of As i and the resulting reduction in point defect density through the formation of As precipitates.…”