2011
DOI: 10.1016/j.mee.2010.12.018
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Optical characterization of anatase TiO2 films patterned by direct ultraviolet-assisted nanoimprint lithography

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Cited by 13 publications
(4 citation statements)
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“…Micro- and nanopatterning of metallic or ceramic nanoparticles (NPs) provides opportunities for developing nanomaterial-based electronics, energy devices, sensors, and other types of devices. Indeed, micro- and nanofabrication and structuring of titanium dioxide NPs has been achieved using various methods including electron-beam lithography, nanoimprint lithography, electro-hydrodynamic patterning, two-photon lithography, direct-write assembly, ion-beam lithography, and atomic force microscopy (AFM) nanolithography …”
Section: Introductionmentioning
confidence: 99%
“…Micro- and nanopatterning of metallic or ceramic nanoparticles (NPs) provides opportunities for developing nanomaterial-based electronics, energy devices, sensors, and other types of devices. Indeed, micro- and nanofabrication and structuring of titanium dioxide NPs has been achieved using various methods including electron-beam lithography, nanoimprint lithography, electro-hydrodynamic patterning, two-photon lithography, direct-write assembly, ion-beam lithography, and atomic force microscopy (AFM) nanolithography …”
Section: Introductionmentioning
confidence: 99%
“…In fact, the few examples in the literature of direct imprint of inorganic TiO 2 systems reveal that some major challenges have to be faced when working with sol-gel compounds: (1) sol-gel films have high surface energy, causing mold release problems; (2) the solvent or organic moieties (chelating or coordinating agents) that help to 'soften' the material generally get trapped in the imprinted structures; and (3) sol-gel materials do not have a workable softening point, generally exhibiting a thermosetting behavior. As a consequence, inorganic titania patterned films obtained either by thermal (T-NIL) or UV assisted (UV-NIL) imprint, suffer from the following limits: (1) only shallow patterns, less than 100 nm [27,28], can be obtained without crack formation; (2) only films with low titania content can be patterned [23,29,30]; (3) high shrinkages occur during processing up to 75% [31][32][33]; and (4) refractive index up to 1.98 at 632 nm [34] can be achieved only after annealing at 500 °C.…”
Section: Introductionmentioning
confidence: 99%
“…23) Nanoscale imprinting on inorganic materials by the sol-gel method, such as nanopatterning on zinc oxide and titanium oxide layers, has been reported. 24,25) However, the sol-gel method only enables patterning on substrates using limited kinds of materials, and substantial volumetric shrinkage during the heating and drying process, which leads to deformation, is also an issue.…”
Section: Introductionmentioning
confidence: 99%