Optical and X-Ray Investigation of Indium Oxide Films on Sapphire Substrates

Tikhii, A. A.; Svyrydova, K. A.; Zhikhareva, Yu. I.; Zhikharev, I. V.

doi:10.1007/s10812-021-01268-3

Cited by 3 publications

(7 citation statements)

References 14 publications

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“…For some of the films studied, we also observed the dependence of their structure on the sputtering time [18,24,25]. Thus, according to the X-ray diffraction measurements, the position of the reflex corresponding to the plane (222) shifts from 30.3 • to 30.6 • as the sputtering time decreases.…”

Section: Resultsmentioning

confidence: 79%

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Formation of In-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=- films by magnetron sputtering on Al-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=- (012) substrates

Tikhii

K.A.

et al. 2022

Optics and Spectroscopy

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The results of studies of the microstructure and optical characteristics of In2O3 films deposited by the dc-magnetron sputtering of a polycrystalline target onto single-crystal sapphire substrates are summarized. The technological regimes of films preparation differed in the deposition time, substrate temperature, and the presence of additional heat treatment of film structures in air. It has been established that the optical refractive index of films deposited on a "cold" substrate increases in the direction from the substrate to the external interface. Heat treatment of the films eliminates the inhomogeneity of the refractive index and leads to a decrease in the band gap. The observed optical properties are explained by the thickness inhomogeneous microstructure of the films, which is formed during sputtering of a target with a relatively low mechanical strength. Keywords: In2O3 films, magnetron sputtering, Al2O3 substrates, refraction index, bandgap width.

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Section: Resultsmentioning

confidence: 79%

“…In the present work, we have collected the results of our earlier studies on the structure and optical properties of In 2 O 3 films obtained on Al 2 O 3 (012) substrates in different dc-magnetron sputtering modes [15][16][17][18][19][20][21][22][23][24][25].…”

Section: Introductionmentioning

confidence: 99%

Formation of In-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=- films by magnetron sputtering on Al-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=- (012) substrates

Tikhii

K.A.

et al. 2022

Optics and Spectroscopy

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show abstract

“…Thus, according to the X-ray diffraction, the reflex corresponding to the (222) plane shifts from 30.3 to 30.6 • with decreasing deposition time. The half-width of the reflex decreases in this case [17,21].…”

Section: Resultsmentioning

confidence: 82%

“…The structure of some of the investigated films deposited at a substrate temperature of 600 • C depends on the deposition time [21]. Thus, according to the X-ray diffraction, the reflex corresponding to the (222) plane shifts from 30.3 to 30.6 • with decreasing deposition time.…”

Section: Resultsmentioning

confidence: 98%

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Optical and X-Ray Studies of Indium Oxide Films Deposited by DC Magnetron Sputtering

Tikhii,

Sviridova,

Zhikhareva

et al. 2024

Acta Phys. Pol. A

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The results of our studies on the structure and optical properties of In2O3 films deposited by DC magnetron sputtering onto Al2O3 (012) substrates are summarized. The films differ in terms of deposition time and substrate temperature. X-ray diffraction shows that the position and half-width of the peak related to the (222) plane of the cubic modification of In2O3 depends on the deposition time. Ellipsometric and optical transmission measurements show that the refractive index of films deposited on substrates at room temperature increases in the direction from the substrate to the external interface. The refractive index of the films deposited at a substrate temperature of more than 300 • C is uniform, except for a rough layer on the surface. Annealing eliminates inhomogeneity of the refractive index and decreases the observed band gap for direct transitions. The latter results from a decrease in lattice defects concentration that causes a change in the Burstein-Moss shift. The true value of the band gap is insensitive to annealing. topics: indium oxide films, band gap, optical properties, X-ray diffraction analysis

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Optical Properties and Structure of In2O3 Films Deposited on Al2O3 (012) Substrates by dc-Magnetron Sputtering

Tikhii,

Nikolaenko,

Svyrydova

et al. 2023

Poverhnostʹ. Rentgenovskie, sinhrotronnye i nejtronnye issledov

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The results of studies of the optical properties and structure of In2O3 films on Al2O3 (012) substrates deposited by dc-magnetron sputtering are summarized. The investigated films differ in the deposition time, substrate temperature, and the presence of additional heat treatment in air. According to X-ray diffraction measurements, these films show a reflex, which correspond to the (222) plane of the cubic modification of In2O3. Its exact position and half-width depend on the deposition time. The optical properties of the obtained films are explained by the microstructure, which is inhomogeneous in thickness and formed during the sputtering of a target with a relatively low mechanical strength. Thus, the refractive index of films deposited on substrates at room temperature increases in the direction from the substrate to the external interface. At a substrate temperature of more than 300°C, the refractive index of the films is uniform, except for a rough layer on the surface. Heat treatment reduces the number of defects in the crystal structure of the films, and leads to densification of the film material. As a result, the inhomogeneity of the refractive index disappears and the observed band gap for direct transitions decreases. The latter result from a change in the Burstein–Moss shift in consequence of the decrease of lattice defects concentration. The band gap for “indirect” transitions (that corresponds to the true value of the band gap) is insensitive to annealing.

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Optical and X-Ray Investigation of Indium Oxide Films on Sapphire Substrates

Cited by 3 publications

References 14 publications

Formation of In-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=- films by magnetron sputtering on Al-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=- (012) substrates

Formation of In-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=- films by magnetron sputtering on Al-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=- (012) substrates

Optical and X-Ray Studies of Indium Oxide Films Deposited by DC Magnetron Sputtering

Optical Properties and Structure of In<sub>2</sub>O<sub>3</sub> Films Deposited on Al<sub>2</sub>O<sub>3</sub> (012) Substrates by dc-Magnetron Sputtering

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