Optical and Structural Properties of TiO2 Thin Films Deposited by RF Magnetron Sputtering

A Coaxial Nozzle Attachment Improving the Homogeneity of the Gas Flow Sputtering

“…Indeed, the refractive index is known to correlate with TiO 2 density which increases with oxygen deficiency [45,46]. The absorption index k was found to be lower (0.00639) for titania deposited using the nozzle compared to the ordinary one (0.00917) in the frame of the optical model (see Figure 5b), which supports the suggested difference in the oxygen stoichiometry sample [47][48][49][50]. In sum, the nozzle attachment increased the homogeneous area of titania films from 3 cm 2 to more than 12 cm 2 and allowed to strongly decrease the reactive gas consumption.…”

The High Impact of Solution Flow Rate on Optical Properties of TiO2 Thin Layers for Optoelectronic Applications

“…The formation of the anatase phase with a unique phase and great crystallization without any type of annealing proved their superiority over the reported one in the literature using expansive radio frequency (RF) magnetron sputtering requiring oxygen flow rate and annealing. [24,25] The Crystallite size and the dislocation density were estimated from equations used in previous literature. [26] In this study the crystallite size increases: 20.34, 26.09, and 32.54 nm for the samples prepared at solution flow rates: 1, 1.5, and 2 ml min −1 , contrary the density of dislocation decreases: 2.41 × 10 −3 , 1.46 × 10 −3 ,0.9 × 10 −3 nm −2 , which proved the good crystallization of TiO 2 thin layers prepared via spray pyrolysis.…”