2005
DOI: 10.1016/j.surfcoat.2005.02.181
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Optical and electronic properties of CrOxNy films, deposited by reactive DC magnetron sputtering in Ar/N2/O2(N2O) atmospheres

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Cited by 37 publications
(28 citation statements)
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“…8). Band gap narrowing by nitrogen incorporation has been previously observed in different transition metal oxynitrides [9,10,12,15,16,38].…”
Section: Optical Propertiesmentioning
confidence: 77%
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“…8). Band gap narrowing by nitrogen incorporation has been previously observed in different transition metal oxynitrides [9,10,12,15,16,38].…”
Section: Optical Propertiesmentioning
confidence: 77%
“…The introduction of oxygen into the tungsten nitride lattice relieves residual stress [15]. Transition metal oxynitrides can be used in numerous applications; for example, CrO x N y can be used for temperature-dependence resistors in thermal radiation detectors [16], TiO x N y can serve as diffusion barriers in silicon-on-sapphire integrated circuits [17] and as decorative coatings [18], HfO x N y can be used as gate material in metal-oxide-semiconductor LBNL-59900 3 devices [19], and rare earth-WO x N y materials are promising as novel pigments [13].…”
Section: Introductionmentioning
confidence: 99%
“…The promising multifunctional materials include transitional metal oxy-nitrides (TM-O-N). They are technologically important with applications in the fields of biocompatible coatings, solar absorbers, electrochromic coatings, nanocrystalline solar cells, and catalysts [22][23][24][25]. As compared to pure oxides, it has been discovered that TM-O-N compounds (TM = Ta, Hf, Zr, Ti) have improved optical properties [26].…”
Section: Introductionmentioning
confidence: 99%
“…But there are also several examples where two reactive gases are introduced in the vacuum chamber during deposition, e.g. oxygen and nitrogen for oxynitride coatings (CrON [6], FeON [7], NbON [8,9], SiON [10], TaON [11], TiON [12], WON [13], ZrON [14]) and acetylene (or methane) and nitrogen for carbonitride coatings (TiCN [15], ZrCN [16]). The reactive magnetron sputtering using one or two reactive gases is accompanied by some difficulties, these are: a) poisoning of the target material by contamination with the reactive gas (e.g.…”
Section: Introductionmentioning
confidence: 99%