2004
DOI: 10.1063/1.1819527
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Optical and electro-optical properties of submicrometer lithium niobate slab waveguides prepared by crystal ion slicing and wafer bonding

Abstract: LiNbO 3 thin film crystals have been produced using crystal ion slicing and wafer bonding. Films with a thickness of 680nm are produced on a thin layer of SiO2, which is deposited on a substrate with electrodes. The crystalline and optical qualities of the fabricated thin films are investigated and are comparable to bulk LiNbO3 single crystals. The effect of thermal annealing is studied using Rutherford backscattering. The refractive indices and the electro-optical (EO) coefficient of the fabricated films are … Show more

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Cited by 199 publications
(97 citation statements)
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“…19 30 , we calculated an effective value r eff ¼ 148 pm V À 1 by neglecting the tensor nature of r and simply considering the field-induced phase shift between two orthogonal components of the transmitted light, as described in the Methods section. Our results represent a major improvement compared with the limited number of published data on EO properties of lead-free oxides integrated on silicon [31][32][33] .…”
Section: Discussionmentioning
confidence: 64%
“…19 30 , we calculated an effective value r eff ¼ 148 pm V À 1 by neglecting the tensor nature of r and simply considering the field-induced phase shift between two orthogonal components of the transmitted light, as described in the Methods section. Our results represent a major improvement compared with the limited number of published data on EO properties of lead-free oxides integrated on silicon [31][32][33] .…”
Section: Discussionmentioning
confidence: 64%
“…However, realization of such predictions has proven challenging owing mainly to difficulties in fabrication. Principally, these difficulties relate to the bonding of piezoelectric materials which, when joined using conventional electrothermal routes, produce tremendous interfacial stresses 19,20 -an issue reflected in the fact that nearly all SAW micropumps that have been developed to date are employ open channels or planar, chemically treated, surfaces. [21][22][23] Alternative techniques such as surface activated bonding using an argon beam, 24 for example, have somewhat addressed this issue by allowing room temperature processing, but, such methods require sample manipulation within high-vacuum environments and a notably atypical vacuum chamber configuration (for example, the MWB-04 by Sojitsu Manufacturing/ Mitsubishi Heavy Industries, Tokyo, Japan), making this route both impractical and prohibitively expensive.…”
mentioning
confidence: 99%
“…A combination of deep helium ion implantation, selective etching and epoxy-resin bonding has been applied to transfer 5-to-10-μm-thick LiNbO 3 layers to silicon substrates [162]. LiNbO 3 -on-LiNbO 3 thin films and modulators, buffered by a SiO 2 layer, attained by ion implantation and wafer bonding have been also reported [163,164]. Interestingly, the EO properties of the films was not degraded during the implantation process.…”
Section: Second-order Nonlinear Photonics On Siliconmentioning
confidence: 99%
“…Alternatively, crystal ion slicing has been successfully employed to obtain high-quality thin films of crystalline LiNbO 3 [162][163][164][165]. A combination of deep helium ion implantation, selective etching and epoxy-resin bonding has been applied to transfer 5-to-10-μm-thick LiNbO 3 layers to silicon substrates [162].…”
Section: Second-order Nonlinear Photonics On Siliconmentioning
confidence: 99%