2009
DOI: 10.1016/j.apsusc.2009.06.088
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Optical and electrical characterization of aluminium doped ZnO layers

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Cited by 31 publications
(11 citation statements)
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“…According to this Burstein-Moss-Shift, the band gap would increase with increasing carrier concentration [40,41]. intermittent illumination of the prepared AZO films.…”
Section: Accepted Manuscriptmentioning
confidence: 95%
“…According to this Burstein-Moss-Shift, the band gap would increase with increasing carrier concentration [40,41]. intermittent illumination of the prepared AZO films.…”
Section: Accepted Manuscriptmentioning
confidence: 95%
“…The multifunctional ZnO material is one of the most promising candidates for the fabrication of the next generation of optoelectronic devices. Besides being a wide band gap semiconductor with gap energy of 3.37 eV, ZnO has several desirable characteristics such as high transmittance in the visible region, low electrical resistivity and non toxicity [9,10]. More interest has been shown on TCOs based on doped ZnO films with cationic dopants such as Al, Ga, or B.…”
Section: Introductionmentioning
confidence: 99%
“…Monitoring of the electrical properties of Al-doped ZnO layers by SE measurements are feasible by using the analytical expression suggested by Yoshikawa and Adachi [24], and the results show correlation between specific resistance and band gap energy and direct exciton strength parameter. [25] Characterization of SiH 2 content in a-Si:H For hydrogenated amorphous silicon (a-Si:H) layers prepared by plasma-enhanced chemical vapor deposition, SiH 2 bonds exist at the internal surface of the void-rich structure and light absorption reduces due to the void formation. In particular, the amplitude of the ε 2 spectra obtained from various a-Si:H layers is expressed completely by the SiH 2 bond density in the a-Si:H and reduces strongly with increasing the SiH 2 content, indicating that microvoids present in the a-Si:H network are surrounded by the SiH 2 bonding state.…”
Section: Se Analysis Of Textured Sno 2 :F Substratementioning
confidence: 99%