Opportunities of polarization-resolved EUV scatterometry on photomasks

Soltwisch, Victor; Biskup, Till; Kolbe, Michael; Scholze, Frank

doi:10.1117/12.2675921

38th European Mask and Lithography Conference (EMLC 2023) 2023

DOI: 10.1117/12.2675921

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Opportunities of polarization-resolved EUV scatterometry on photomasks

Victor Soltwisch,

Till Biskup,

Michael Kolbe

et al.

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Opportunities of polarization-resolved EUV scatterometry on photomasks

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References 21 publications

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