2023
DOI: 10.1021/acs.macromol.3c01292
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Opportunities, Challenges, and Pitfalls in Making, Characterizing, and Understanding Polymer Brushes

Christian W. Pester,
Harm-Anton Klok,
Edmondo M. Benetti
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Cited by 10 publications
(1 citation statement)
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“…Polymer brushes are surface-tethered macromolecules that can be engineered via a broad range of surface-initiated polymerizations (SI-Ps). , Beginning with seminal reports on the utility of photons in SI-Ps, various light-mediated surface-initiated (SI) reversible deactivation radical polymerization (RDRP) approaches have been established and advanced. This includes light-mediated, SI atom transfer radical polymerization (SI-ATRP), SI nitroxide mediated polymerization (SI-NMP), SI photoiniferter mediated polymerization (SI-PMP), SI thiol- methacrylate photopolymerizations, and SI photoinduced electron transfer-reversible addition–fragmentation chain transfer polymerization (SI-PET-RAFT). Many of these chemistries can now be mediated from ultraviolet (UV) to near-infrared (IR) wavelengths, with tolerance to ambient oxygen, and used for complex topographical patterning. …”
Section: Introductionmentioning
confidence: 99%
“…Polymer brushes are surface-tethered macromolecules that can be engineered via a broad range of surface-initiated polymerizations (SI-Ps). , Beginning with seminal reports on the utility of photons in SI-Ps, various light-mediated surface-initiated (SI) reversible deactivation radical polymerization (RDRP) approaches have been established and advanced. This includes light-mediated, SI atom transfer radical polymerization (SI-ATRP), SI nitroxide mediated polymerization (SI-NMP), SI photoiniferter mediated polymerization (SI-PMP), SI thiol- methacrylate photopolymerizations, and SI photoinduced electron transfer-reversible addition–fragmentation chain transfer polymerization (SI-PET-RAFT). Many of these chemistries can now be mediated from ultraviolet (UV) to near-infrared (IR) wavelengths, with tolerance to ambient oxygen, and used for complex topographical patterning. …”
Section: Introductionmentioning
confidence: 99%