Abstract:One of the most promising techniques for the extension of 193nm immersion lithography must be Self-Aligned Multiple Patterning (SAMP) [1,2,3] at present. We have studied this SAMP from several aspects, which are scaling capability, mitigation of process complexity, pattern fidelity, affordability and so on. On the other hand, Gridded Design Rule (GDR) concept with single directional layout (1D layout) [4] extended the down-scaling with 193-immersion furthermore and relieved the process variation and process co… Show more
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