1989
DOI: 10.1103/physrevlett.62.2180
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Onset of superconductivity in the two-dimensional limit

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Cited by 760 publications
(594 citation statements)
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“…5d represents the threshold normal-state sheet resistance h/4e 2 , or 6.5 kΩ/□ for a superconductor-insulator transition. 38 Only the Al-rich samples have normal-state sheet resistance below the dashed line; these might thus exhibit superconductivity. The sheet carrier density is around 10 14 /cm 2 for all the samples, close to the expected value of 1.7 × 10 14 /cm 2 .…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…5d represents the threshold normal-state sheet resistance h/4e 2 , or 6.5 kΩ/□ for a superconductor-insulator transition. 38 Only the Al-rich samples have normal-state sheet resistance below the dashed line; these might thus exhibit superconductivity. The sheet carrier density is around 10 14 /cm 2 for all the samples, close to the expected value of 1.7 × 10 14 /cm 2 .…”
Section: Resultsmentioning
confidence: 99%
“…The dashed line in d is the quantum resistance limit h/4e 2 . 38 The dashed line in e indicates the theoretical value of sheet carrier density for 10 unit-cell films with different stoichiometry under the assumption of pure electronic reconstruction. 31 …”
Section: Methodsmentioning
confidence: 99%
“…Examples include transitions in quantum Hall systems [3], localization in Si-MOSFETs (metal oxide silicon field-effect transistors; Ref. [4]) and the superconductor-insulator transition in two-dimensional systems [5,6]. Both classical and quantum critical points are governed by a diverging correlation length, although quantum systems possess additional correlations that do not have a classical counterpart.…”
mentioning
confidence: 99%
“…This mobility dependent metal-to-insulator transition can be partly understood with the above-discussed Ioffe-Regel criterion in the 3D context. It is also well known that 2D metallic films turn insulating once their sheet resistance becomes similar to or larger than the quantum resistance (h/e 2  26 kΩ) as the thickness is reduced, due to enhanced surface scattering and other disorder effects [45] , [53]. Altogether, this comparison clearly shows that the WAL 1-to-0 transition observed in the low mobility samples whose surface Fermi levels are far from the surface-hybridization gap at the Dirac point is due to enhanced disorder in the ultrathin regime and not due to the gap opening at the Dirac point.…”
Section: Weak Anti-localizationmentioning
confidence: 99%