One-Step Synthesis of Metal/Semiconductor Heterostructure NbS₂/MoS₂

Abstract

Chemical vapor deposition (CVD) has proven its surpassing advantages, such as larger scale, interlayer orientation control and clean interface, in the synthesis of transitional metal dichalcogenide (TMDC) semiconductor/semiconductor van der Waals (vdW) heterostructures. However, it is suffering problems of high melting points and low chemical reactivity of metal oxide feedstocks in the preparation of high-quality metal/semiconductor (M/S) TMDC vdW heterostructures. Here, for the first time, we report the synthesis of the M/S TMDC vdW heterostructure NbS2/MoS2 via a one-step hailde-assisted CVD method, which effectively overcomes the drawbacks of metal oxide precursors. What's more, this one-step method provides the high quality and clean interface of the NbS2/MoS2 heterostructure, which has been proved by the transmission electron microscopy characterization. A mechanism that MoS2 finishes the growth first and subsequently serves as a superior substrate for the growth of NbS2 is proposed. This novel method will open up new opportunities in the syntheses of other M/S TMDC vdW heterostructures and facilitate the research of the TMDC M/S interface.

Edge‐Enriched Ultrathin MoS2 Embedded Yolk‐Shell TiO2 with Boosted Charge Transfer for Superior Photocatalytic H2 Evolution

“…Transition metal dichalcogenides (TMDs), such as molybdenum disulfide (MoS 2 ), Tungsten disulfide (WS 2 ), niobium disulphide (NbS 2 ), and Titanium disulfide (TiS 2 ), are typically used for catalysis, optical materials, energy storage, etc., considering their unique electronic properties and metallic characteristics. Due to its excellent mechanical strength and physicochemical properties, MoS 2 has sparked great attention as a promising and sustainable catalyst.…”

Edge‐Epitaxial Growth of 2D NbS2‐WS2 Lateral Metal‐Semiconductor Heterostructures

“…Very few reports about the uniform and controllable growth of monolayer metallic TMDs have been made so far by chemical vapor deposition (CVD) method . Although lots of interesting physics and electronic properties have been explored from 2D TMD semiconductors and its heterostructures obtained via one‐step, two‐step, and even multistep growth processes, the synthesis of 2D metallic TMDs and establishment of Van der Waals (vdW) heterostructures between metallic and semiconductor TMDs are sparsely reported . These have not only hindered the exploration of their electronic/magnetic properties but also greatly impeded their practical applications in electronic devices.…”

Recent progress in the controlled synthesis of 2D metallic transition metal dichalcogenides

“…Moreover, such alkali halides-assisted CVD method was also employed to directly grow 2D metal-semiconductor TMDC heterostructures, such as NbS 2 /MoS 2 vertical stacks (one-step growth), NbS 2 -WS 2 and 1T′-2H-MoTe 2 coplanar junctions (two-step growth) [38,87,88], which benefited from the universality of such a method to grow an arbitrary material. The methodology and mechanism of the alkali halides-assisted CVD route have been widely used in several experimental efforts [23,86,89,90].…”

“…However, a comprehensive review about the most recent progress on the preparations of 2D MTMDCs is still lacking. In this topic review, we will summarize the recent advances regarding the synthetic routes of 2D MTMDC materials (VS 2 , VSe 2 , TaS 2 , TaSe 2 , NbS 2 , NbSe 2 , etc) [23][24][25][36][37][38][39][40][41][42][43], including mechanical/chemical exfoliations, CVT, and MBE. More significantly, we will introduce the state-of-the-art CVD routes used to realize the large-scale growth of 2D MTMDCs, by using different transition metal-based feedstocks including transition metal chlorides (MCl n ) and transition metal oxidations (MO n ) mixed with alkali halides (AH, where A=Na or K, and H=Cl, Br or I).…”