2023
DOI: 10.1038/s41377-023-01086-6
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One-step printable platform for high-efficiency metasurfaces down to the deep-ultraviolet region

Abstract: A single-step printable platform for ultraviolet (UV) metasurfaces is introduced to overcome both the scarcity of low-loss UV materials and manufacturing limitations of high cost and low throughput. By dispersing zirconium dioxide (ZrO2) nanoparticles in a UV-curable resin, ZrO2 nanoparticle-embedded-resin (nano-PER) is developed as a printable material which has a high refractive index and low extinction coefficient from near-UV to deep-UV. In ZrO2 nano-PER, the UV-curable resin enables direct pattern transfe… Show more

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Cited by 58 publications
(50 citation statements)
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“…The simple design of the metasurfaces has allowed their fabrication using NIL with high throughput. Moreover, thanks to the simple design, the metasurfaces can also be realized by using other facile, cost‐effective fabrication methods, [ 51,52 ] which will further pave the way for metasurface‐generated holography for more practical applications in different wavelength regimes. In addition, with the efforts to contain high‐density data capacity of a single metasurface, the current research findings can be easily combined with other design approaches such as spatial multiplexing, and meta‐atom design.…”
Section: Discussionmentioning
confidence: 99%
“…The simple design of the metasurfaces has allowed their fabrication using NIL with high throughput. Moreover, thanks to the simple design, the metasurfaces can also be realized by using other facile, cost‐effective fabrication methods, [ 51,52 ] which will further pave the way for metasurface‐generated holography for more practical applications in different wavelength regimes. In addition, with the efforts to contain high‐density data capacity of a single metasurface, the current research findings can be easily combined with other design approaches such as spatial multiplexing, and meta‐atom design.…”
Section: Discussionmentioning
confidence: 99%
“…Nanoimprint lithography (NIL) is a low-cost, high-throughput, and high-resolution patterning method that involves the use of a soft stamp. It has been actively researched by using various materials [3337] and combining with different fabrication methods [38] . In NIL processes, a stamp consisting of inverse patterns replicates the desired patterns on a substrate by curing the resist with ultraviolet (UV) or heat.…”
Section: Soft Lithographymentioning
confidence: 99%
“…Firstly Due to the pronounced aspect ratio of the building block some of the steps required in nanoimprint lithography may be omitted. For instance, no mold is needed [72][73][74] to pattern the surface. 75 Sophisticated and difficult to scale procedures as supercritical drying, 76 interface self-assembly 77 or special set-ups 78 are not required to correctly place the building blocks.…”
Section: Defogging Metasurfacementioning
confidence: 99%