2010
DOI: 10.1002/ppap.201000024
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One Step Polymerization of Sulfonated Polystyrene Films in a Dielectric Barrier Discharge

Abstract: Thin sulfonated polystyrene films were prepared by high pressure PECVD of styrene and trifluoromethane sulfonic acid using a DBD. Argon or helium was used as carrier gas. The chemical composition of the pp‐sulfonated polystyrene was investigated by XPS, SSIMS, and FTIR. XPS shows that the content in sulfonated groups of the films deposited in the discharge can be tuned by varying the temperature of the acid monomer or by improving the HF voltage. Therefore, the films obtained are rich in ionizable groups (more… Show more

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Cited by 42 publications
(37 citation statements)
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“…More and more studies present results of atmospheric deposition of coatings, both inorganic and organic. For instance, Morajev deposited SiO x and SiN x layers,5 Merche deposited polystyrene and sulphonated polystyrene coatings,6, 7 Nisol deposited polyethylene glycol layers 8. Among the organic coatings, acrylates and their derivatives received great attention.…”
Section: Introductionmentioning
confidence: 99%
“…More and more studies present results of atmospheric deposition of coatings, both inorganic and organic. For instance, Morajev deposited SiO x and SiN x layers,5 Merche deposited polystyrene and sulphonated polystyrene coatings,6, 7 Nisol deposited polyethylene glycol layers 8. Among the organic coatings, acrylates and their derivatives received great attention.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover it reduces the number of steps as it can integrate the cleaning, the etching of the substrate and the deposition of the coating in one step. The properties of the coating such as the thickness, the morphology, the chemical composition, or the film structure can be tailored by modifying the experimental parameters of the discharge 4, 5…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, it was possible to produce plasma‐membranes, thermally stable, with a higher content in sulfonic acids groups (up to 4% at 1 kV and up to 6.6% at 2 kV) than in the Nafion 117 (for which sulfonated groups of around 1% is reported). The presence of sulfonic acid groups was also confirmed by FTIR and static SIMS 23…”
Section: Resultsmentioning
confidence: 82%
“…The pp‐sulfonated PS thin films were deposited in one single step, in a home‐built DBD. The cylindrical glass chamber has already been detailed in previous papers 23, 24. The schematic diagram of the reactor is presented in Figure 2.…”
Section: Methodsmentioning
confidence: 99%