“…Proposed approaches include both classical plasma-enhanced chemical vapor deposition (PECVD) processes [9,14,41] and innovative aerosol-assisted plasma deposition (AAPD) strategies [40,[42][43][44]. They exploit different direct [40,42,43] and remote [9,14,44] AP plasma sources operating close to room temperature and, therefore, suitable for the surface modification of both inorganic and polymeric materials. Various studies have demonstrated that the chemical composition and morphology of the deposited coatings can be easily adjusted by changing process parameters such as the plasma excitation conditions, the feed mixture composition and the deposition time [9,14,[39][40][41][42][43][44].…”