2003
DOI: 10.1109/tim.2003.817156
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On-wafer noise characterization of low-noise amplifiers in the Ka-band

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Cited by 5 publications
(2 citation statements)
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“…Additionally, the size chosen for the transistors of all the stages of the designed amplifier corresponds to the selected one: 4 fingers × 20 µm gate periphery. Furthermore, a four-fingered MESFET was used to minimize the parasitics in the gate pad due to their parallelism and, at the same time, succeed in an adequate gain suitable for the design specification [35,36]. In general, it has been assumed that a single-stage amplifier configured in singleended mode has approximately the same gain as a stage in differential mode.…”
mentioning
confidence: 99%
“…Additionally, the size chosen for the transistors of all the stages of the designed amplifier corresponds to the selected one: 4 fingers × 20 µm gate periphery. Furthermore, a four-fingered MESFET was used to minimize the parasitics in the gate pad due to their parallelism and, at the same time, succeed in an adequate gain suitable for the design specification [35,36]. In general, it has been assumed that a single-stage amplifier configured in singleended mode has approximately the same gain as a stage in differential mode.…”
mentioning
confidence: 99%
“…The small-signal and noise model of the power transistors are extracted from scattering and noise parameter measurements carried out up to 40 GHz. The noise parameters are measured using a Ka-band sourcepull test bench developed in our laboratory [7]. This model is scalable in terms of gate geometry (width and number of gate fingers) and drain current I ds .…”
Section: Device Characteristicsmentioning
confidence: 99%