2021
DOI: 10.1007/s10854-021-05374-y
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On thermal and optical sensor applications of chitosan molecule in the Co/Chitosan/p-Si hybrid heterojunction design

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Cited by 6 publications
(4 citation statements)
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“…Otherwise, all the fabricated devices show a rectification behavior, where the highest rectification ratio (RR~137) under dark conditions is observed in the case of the Ag/Cs-MV/p-Si device, as shown in Figure S8a (Supporting Information). The difference in the obtained low values of RR compared to the previously reported values of Co/chitosan/p-Si [13] may be ascribed to the difference between the work function of the utilized electrodes [38,49]. Following is the thermionic emission model for estimating the microelectronic parameters of the designed non-ideal junctions (n > 1) of series resistance, R s , where the current-voltage-temperature (I-V-T) is represented as follows [34,38,39,46]:…”
Section: Photosensing Performancecontrasting
confidence: 89%
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“…Otherwise, all the fabricated devices show a rectification behavior, where the highest rectification ratio (RR~137) under dark conditions is observed in the case of the Ag/Cs-MV/p-Si device, as shown in Figure S8a (Supporting Information). The difference in the obtained low values of RR compared to the previously reported values of Co/chitosan/p-Si [13] may be ascribed to the difference between the work function of the utilized electrodes [38,49]. Following is the thermionic emission model for estimating the microelectronic parameters of the designed non-ideal junctions (n > 1) of series resistance, R s , where the current-voltage-temperature (I-V-T) is represented as follows [34,38,39,46]:…”
Section: Photosensing Performancecontrasting
confidence: 89%
“…It is well known that the controllability of the barrier height depends on the characteristics of the inserted organic film between the metal/semiconductor interface, such as its HOMO and LUMO energetic position, and their position relative to semiconductor electron affinity and electrode work function. The obtained values of Φ B0 of all the fabricated devices are higher than those previously recorded for Au/Cs/n-Si (~0.73 eV [23]) and Co/Cs/p-Si (~0.68 eV [13]) but lower than those estimated for Ag/Cs/n-Si (~0.94 eV [22] and Ag/Cs/n-Si (~0.88 eV [12]). The values of shunt resistance, R sh , and series resistance, R s , of the fabricated devices were estimated from the junction's resistance, R j , and plotted, as shown in Figure S8e,f (Supporting Information), respectively.…”
Section: Photosensing Performancecontrasting
confidence: 67%
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