2008
DOI: 10.1016/j.diamond.2007.12.059
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On the use of CrN/Cr and CrN interlayers in hot filament chemical vapour deposition (HF-CVD) of diamond films onto WC-Co substrates

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Cited by 53 publications
(21 citation statements)
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“…More recently, treatment in a fluidized bed of bubbling diamond particles effectively increased the WC-Co substrate roughness and selectively removed the softer Co surface (Polini et al, 2006a,b;Polini and Barletta, 2008). This technique yields remarkable results without the use of costly or time-consuming technologies and, more importantly, without using dangerous chemicals or procedures.…”
Section: Surface Preparation Of Tungsten Carbide Substrates For Hf-cvmentioning
confidence: 95%
“…More recently, treatment in a fluidized bed of bubbling diamond particles effectively increased the WC-Co substrate roughness and selectively removed the softer Co surface (Polini et al, 2006a,b;Polini and Barletta, 2008). This technique yields remarkable results without the use of costly or time-consuming technologies and, more importantly, without using dangerous chemicals or procedures.…”
Section: Surface Preparation Of Tungsten Carbide Substrates For Hf-cvmentioning
confidence: 95%
“…This possibility has attracted some attention towards the deposition of diamond coatings on WC-Co drawing dies, owing to their potential industrial applications [2][3][4]. However, diamond coatings on WC-Co drawing die is a formidable challenge due to the presence of cobalt binder [5,6], (which promotes the formation of graphite instead of diamond thereby completely mitigating the effect of a diamond coating) in addition to their complex geometry and weight, in realizing uniform coatings as well as characterizing the interior of the drawing die. Recently, Sun et al [7], reported an enhanced performance of NCD coated WC-Co dies for drawing copper tubes.…”
Section: Introductionmentioning
confidence: 99%
“…Chemical etching starts with Caro's acid followed by Murakami's alkaline etching. The acid etching removes cobalt residues 11,12 from the surface after heat treatment. The Murakami's solution specifically etches WC grains 13,14 to increase surface roughness.…”
Section: Methodsmentioning
confidence: 99%