We report on the magnetic field dependence of the apparent ferromagnetic ordering temperature (T F ) of the ferromagnetic semiconductor EuO doped with 8% Gd, La, or Lu. Chemical doping is a common method to increase the T F of EuO. Recent findings demonstrate that in thin films only a fraction of the dopants donate electrons into the conduction band. We show that the T F of doped EuO determined by the standard procedure drastically increases with applied magnetic fields. The comparison of measured data to theoretical models is in agreement with large fractions of dopant electrons being localized and the presence of magnetic disorder. and thin films. 8,[12][13][14][20][21][22][23][24][25] Despite exploiting the same physical mechanism to increase T C , the reported improvements vary strongly from experiment to experiment even for identical dopant elements and comparable dopant concentrations. These discrepancies might partially be explained by different magnetic background fields and different methods used to extract T C from the magnetic data including several superconducting quantum interference device (SQUID) magnetometry-based methods, x-ray magnetic dichroism (XMCD), second harmonic generation (SHG), magneto-optic Kerr rotation, and neutron reflectometry (see temperature (T F ) for meaurements performed in non-zero magnetic background fields.To address these questions and to provide a database for the comparison of experiments, in this Letter we investigate the dependence of T F of 8% rare-earth-doped EuO (Eu 0.92 B 0.08 O, with B = Gd, La, Lu) on applied external magnetic fields. The doping concentration was chosen to be in the range of the maximum reported and theoretically predicted T F values. 15,16,[21][22][23]26,27,34,35 The dopants were chosen to provide a spectrum of ionic radii, electron configurations, and to investigate possible differences between magnetic (Gd) and non-magnetic (La, Lu) dopants. To analyze systematically changes originating from applied external magnetic fields, we kept film thickness, microstructure, and oxygen content constant.The films were grown using reactive oxide molecular-beam epitaxy (Veeco 930 and GEN10MBE systems) on YAlO 3 single crystal substrates oriented within ±0.5• of (110). 37 Europium and the dopant elements were co-evaporated from effusion cells. The respective fluxes were calibrated to the desired Eu/dopant ratio using a quartz crystal microbalance. The total metal flux was set to 1.1 × 10 14 atoms /cm 2 s. The films were deposited in O 2 partial pressuresTorr above the vacuum chamber background pressure of 2 × 10 −9 Torr.To minimize additional charge carrier doping originating from oxygen vacancies, the films 3 were grown in the adsorption controlled growth regime at a substrate temperature of T sub =
350• C. 24,37 To prevent their oxidation and to allow ex situ analysis, all films were capped with about 20 nm of amorphous silicon. After growth, ex situ four-circle x-ray diffraction (XRD) was used to characterize the structural quality of all films....