We propose a nondestructive technique based on atomic core-level shifts to characterize the interface quality of thin film nanomaterials. Our method uses the inherent sensitivity of the atomic core-level binding energies to their local surroundings in order to probe the layer-resolved binary alloy composition profiles at deeply embedded interfaces. From an analysis based upon high energy x-ray photoemission spectroscopy and density functional theory of a Ni=Cu fcc (100) model system, we demonstrate that this technique is a sensitive tool to characterize the sharpness of a buried interface. We performed controlled interface tuning by gradually approaching the diffusion temperature of the multilayer, which lead to intermixing. We show that core-level spectroscopy directly reflects the changes in the electronic structure of the buried interfaces, which ultimately determines the functionality of the nanosized material. DOI: 10.1103/PhysRevLett.97.266106 PACS numbers: 68.35.Ct, 02.70.Hm, 61.10.Ht Thin film nanodevices such as multilayers and superlattices represent numerous new opportunities in materials science. Their unique properties arise from the introduction of interfaces and the emergence of finite size effects due to quantum interference [1][2][3][4][5][6]. The interfaces represent tunable parameters, where interface composition or film thickness and geometry can be used to alter various magnetic, optical, and mechanical properties.A range of methods to describe multilayer interface properties exist which can coarsely be divided into destructive and nondestructive techniques. In destructive methods such as mass spectrometry and microscopy techniques (e.g., transmission electron microscopy [7] and its variants), it is necessary to destructively modify the samples in some way in order to obtain the desired information. Nondestructive methods include scattering techniques such as x-ray or neutron diffraction and reflection [8,9]. However, interface information at the atomic scale is difficult to obtain. Moreover, while other techniques such as scanning tunneling microscopy and atomic force microscopy provide local structural information, these methods are generally limited to surface analysis and cannot reliable describe buried interface qualities [10,11]. Surface sensitivity is also strongly associated with photoelectron spectroscopy due to the short mean free path of electrons with kinetic energies in the range of 50 -500 eV [12].In this Letter we propose a new nondestructive characterization technique to analyze the interfacial quality of layered structures based on previous theoretical predictions [1,13]. The method relies upon accurate measurements of chemical shifts in core levels [14,15] by means of highkinetic-energy photoelectron spectroscopy. Because of the much larger escape depth of high-kinetic-energy electrons our technique is a perfectly adapted tool to obtain information such that layer-resolved binary alloy composition profiles A 1ÿc n B c n at embedded A=B interfaces can be determined indep...