On the role of plasma-surface interactions in dc magnetron discharges in Ar-N<sub>2</sub>gas mixtures

Debal, F.; Bretagne, J.; Dauchot, J. P.; Hecq, M.; Wautelet, M.

doi:10.1088/0963-0252/10/1/305

Cited by 15 publications

(24 citation statements)

References 19 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…[14] Many research works argue that atomic N plays an important role in deposition nitride coatings. [14,16] However, in our case, it doesn't seem to behave like that. The fact that no atomic N emission characteristics were found in both "neartarget-zone" and "near-substrate-zone" inferred that Cr and atomic N reaction is not dominant to form CrN coatings.…”

Section: Discussioncontrasting

confidence: 51%

“…Considering the process on target surface firstly: assuming nitrogen molecules gather on target surface and react with target atomics to form a thin covering layer, then electron impact dissociated Ar + and N 2 + ions were accelerated to bombard target surface and eject Cr or CrN species. As there aren't any CrN optical emission characteristics to be observed, the sputtering CrN molecules should be instantaneously dissociated and reinjected into plasma as Cr + N according to Ref [16] . However, the fact is that there is also no N emission found in OES spectrum.…”

Section: Discussionmentioning

confidence: 99%

See 1 more Smart Citation

Influence of RF Bias on the Deposition of CrN Studied by OES

Zhang¹,

Rapaud²,

Bonasso³

et al. 2008

Adv Eng Mater

View full text Add to dashboard Cite

Chromium nitride coatings were synthesized by DC magnetron sputtering techniques. Optical emission spectroscopy (OES) was applied to investigate the role of the different level RF substrate biases. The results show that the main chemical reaction process occurred on substrate surface and OES signal ratio I(N2)/I(Cr) can be used to predict the composition evolution. Ion bombardment effects were identified, especially in the range from 60 V to 100 V, they provide benefits to make coating denser and improve mechanical properties.

show abstract

Section: Discussioncontrasting

confidence: 51%

Section: Discussionmentioning

confidence: 99%

Influence of RF Bias on the Deposition of CrN Studied by OES

Zhang¹,

Rapaud²,

Bonasso³

et al. 2008

Adv Eng Mater

View full text Add to dashboard Cite

show abstract

“…The population of N 2 (C 3 Π u ) states (upper level of the detected second positive system) is mainly due to direct electron impact excitation from the ground state X 1 Σ + g [37,38], which is a result of the collision with electrons via reaction (16), whose energy is above the excitation threshold (11.1 eV). Reaction (19) is responsible for the electron impact excitation of N 2 molecule from ground state to N + 2 (B 2 Σ u ) excited state, which is the upper level of the detected first negative system.…”

Section: Plasma Processes -First Steps Leading To An Organic Chemistrymentioning

confidence: 99%

Organic chemistry of NH₃and HCN induced by an atmospheric abnormal glow discharge in N₂-CH₄mixtures

Horváth

Krčma

Polachova

et al. 2010

Eur. Phys. J. Appl. Phys.

View full text Add to dashboard Cite

Abstract. The formation of the chemical products produced in an atmospheric glow discharge fed by a N2-CH4 gas mixture has been studied using Fourier Transform InfraRed (FTIR) and Optical Emission Spectrometry (OES). The measurements were carried out in a flowing regime at ambient temperature and pressure with CH4 concentrations ranging from 0.5% to 2%. In the recorded emission spectra the lines of the second positive system CN system and the first negative system of N2 were found to be the most intensive but atomic H α , H β , and C (247 nm) lines were also observed. FTIR-measurements revealed HCN and NH3 to be the major products of the plasma with traces of C2H2. These same molecules have been detected in Titan's atmosphere and the present experiments may provide some novel insights into the chemical and physical mechanisms prevalent in Titan's atmosphere with these smaller species believed to be the precursors of heavier organic species in Titan's atmosphere and on its surface.

show abstract

“…Therefore the production rate of the upper level of the transition is a function of the N 2 concentration. (11,12) The population of this level results from the collision with electrons, whose energy is above the excitation threshold (11.1 eV).…”

Section: The Mechanisms Of the Upper Level Population And Their Emissionmentioning

confidence: 99%

“…The measurement of the emission intensity of this band head gives the population of the N 2 (C 3 u ) state, which can be related to the ground state N 2 (X 1 g + ) popu1ation. (12) …”

Section: The Mechanisms Of the Upper Level Population And Their Emissionmentioning

confidence: 99%

Optical Emission Spectroscopy of Abnormal Glow Region in Nitrogen Plasma

Qayyum

Zeb

Ali

et al. 2005

Plasma Chem Plasma Process

View full text Add to dashboard Cite

Optical emission spectroscopy of the active species in N 2 plasma is carried out to investigate their concentration as a function of discharge parameters such as filling pressure (2.0-7.0 mbar), source power (100-200 W) and gas flow rate (50-300 mg/min). The primary motivation of this work is to obtain reliable information about the concentration of the active species of N 2 plasma, which play an important role in plasma surface nitriding processes. Emission intensity from the selected electronic excited states of molecular and atomic species is evaluated as a function of discharge parameters to investigate their concentration. The emission intensity ratio I (N + 2 )/I (N 2 ) and I (N + )/I (N ) of the electronic transitions is also evaluated as a function of discharge parameters to investigate the relative dependence of their concentrations. It is observed that the concentration of the active species of N 2 plasma is strongly affected by the filling pressure and source power whereas flow rate has no significant effect. An increased occurrence of N + 2 molecular ions in comparison with N 2 molecules, and N + ions in comparison with N atoms is observed with source power whereas decreased occurrence of N + 2 molecular ions in comparison with N 2 molecules, and N + ions in comparison with N atoms is observed with the rise in filling pressure.

show abstract

On the role of plasma-surface interactions in dc magnetron discharges in Ar-N₂gas mixtures

Cited by 15 publications

References 19 publications

Influence of RF Bias on the Deposition of CrN Studied by OES

Influence of RF Bias on the Deposition of CrN Studied by OES

Organic chemistry of NH₃and HCN induced by an atmospheric abnormal glow discharge in N₂-CH₄mixtures

Optical Emission Spectroscopy of Abnormal Glow Region in Nitrogen Plasma

Contact Info

Product

Resources

About

On the role of plasma-surface interactions in dc magnetron discharges in Ar-N2gas mixtures

Cited by 15 publications

References 19 publications

Influence of RF Bias on the Deposition of CrN Studied by OES

Influence of RF Bias on the Deposition of CrN Studied by OES

Organic chemistry of NH3and HCN induced by an atmospheric abnormal glow discharge in N2-CH4mixtures

Optical Emission Spectroscopy of Abnormal Glow Region in Nitrogen Plasma

Contact Info

Product

Resources

About

On the role of plasma-surface interactions in dc magnetron discharges in Ar-N₂gas mixtures

Organic chemistry of NH₃and HCN induced by an atmospheric abnormal glow discharge in N₂-CH₄mixtures