2015
DOI: 10.1016/j.ultramic.2015.04.001
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On the role of inelastic scattering in phase-plate transmission electron microscopy

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Cited by 15 publications
(12 citation statements)
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“…The phase shift φ PP and defocus ∆ f of the images are determined by a Matlab-based (Math-Works, Natick, MA, USA) pattern recognition software [20] under the assumption that the phase shift is only induced on the unscattered electrons. A time series of HFPP TEM images allows to trace the PCTF evolution and thus the phase shift induced by an electron-beam induced modification of the thin film.…”
Section: Accepted Manuscriptmentioning
confidence: 99%
“…The phase shift φ PP and defocus ∆ f of the images are determined by a Matlab-based (Math-Works, Natick, MA, USA) pattern recognition software [20] under the assumption that the phase shift is only induced on the unscattered electrons. A time series of HFPP TEM images allows to trace the PCTF evolution and thus the phase shift induced by an electron-beam induced modification of the thin film.…”
Section: Accepted Manuscriptmentioning
confidence: 99%
“…Including an amorphous part in the illuminated sample area leads to the presence of Thon rings which are exploited to determine j PP by a pattern recognition process [19] adapted to PP TEM [20].…”
Section: Resultsmentioning
confidence: 99%
“…The short elastic mean free path in the ZAC-alloy is not fully compensated by the reduced film thickness because P elastic in the ZAC-alloy is increased by a factor of angles. Phonon-scattered electrons in the object can be excluded from image formation by an appropriately sized objective aperture [31]. The inelastic mean free path λ inelastic can be measured from lowloss EELS spectra if the film thickness t is known [32] λ inelastic = t ln I ZL +I LL I ZL…”
Section: Discussionmentioning
confidence: 99%
“…The probability for inner-shell ionization is small compared with phonon and plasmon scattering, which are the dominating processes with energy losses of up to 30 eV. Electrons which are phonon scattered in the object can be excluded from image formation by an appropriately sized objective aperture because phonon scattering predominantly occurs in large scattering angles (Hettler et al, 2015). However, inelastic scattering in the PP material remains a limiting factor in the application of thin-film PPs in HRTEM.…”
Section: Discussionmentioning
confidence: 99%