1996
DOI: 10.1149/1.1836914
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On the Repassivation Behavior of High‐Purity Titanium and Selected α, β, and β + α Titanium Alloys in Aqueous Chloride Solutions

Abstract: The repassivation characteristics of a titanium thin film evaporated from a high-purity Ti source as well as selected a (commercially pure Ti, Ti-5A1-2.5Sn), 13, and 13 + a titanium alloys (Ti-l5Mo-3Nb-3A1, Ti-15V-3Cr-3Al-3Sn, and Ti-3A1-8V-6Cr-4Zr-4Mo) were examined. Both the rapid thin film fracture and scratch depassivation methods were used in aqueous chloride solutions (0.6 M NaCl, 5 M HC1, 5 M LiC1, 5 M HC1 + 1 M T1C13). Bare surface open-circuit potentials followed the relationship E(VSCE) = -1.20 (pH 0… Show more

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Cited by 53 publications
(38 citation statements)
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“…A decrease in these oxygen species at the surface leads to a relative decrease in the fraction of Ti 3+/4+ that gets reincorporated into the oxide layer with an increase in the relative number of Ti 3+/4+ ions that are etched ͑i.e., dissolve into the solution, forming complexes like TiF 6 2− , TiOH 2+ , TiF x ͑OH͒ y x+y −4 , etc. 24,25 Hence, under the influence of chloride ions we expect that the oxide thickness will approach a new thinner, steady-state oxide layer ͑␦ SS * ͒ as the balance is swayed toward the etching of, and away from reincorporation of, Ti ions.…”
Section: Resultsmentioning
confidence: 99%
“…A decrease in these oxygen species at the surface leads to a relative decrease in the fraction of Ti 3+/4+ that gets reincorporated into the oxide layer with an increase in the relative number of Ti 3+/4+ ions that are etched ͑i.e., dissolve into the solution, forming complexes like TiF 6 2− , TiOH 2+ , TiF x ͑OH͒ y x+y −4 , etc. 24,25 Hence, under the influence of chloride ions we expect that the oxide thickness will approach a new thinner, steady-state oxide layer ͑␦ SS * ͒ as the balance is swayed toward the etching of, and away from reincorporation of, Ti ions.…”
Section: Resultsmentioning
confidence: 99%
“…If the bare surface polarization response was ohmically limited even at a higher solution resistance than predicted, the current density should still vary linearly with the applied potential. 13) Figures 5A-5C indicates a nonlinear response. Therefore, it appears that an ohmic limitation does not limit the observed current density.…”
Section: Discussionmentioning
confidence: 99%
“…The rate of repassivation of many metals makes the acquisition of rapid current decay due to oxide growth difficult. Therefore, depassivation has been investigated by the mechanical breakdown of the passive film employing scratching, 10) guillotining, [11][12][13] or thin-film breaking. 14,15) In these techniques, the relaxation process immediately after the mechanical destruction of the passive film was investigated by chronoamperometry.…”
Section: Introductionmentioning
confidence: 99%
“…In the fretting fatigue test in PBS(-), a surface oxide film which had formed on the contact surface was broken, and a newly formed surface was exposed during each load cycle. For Zr and its homologous series element Ti, the time required for repassivation was several 10 ms, 22) and the new surface caused 2 mm by fretting was immediately re-oxidized. For Zr-based amorphous alloys, similar behavior was reported, 21) and thus it can be considered that no corrosion pits appeared on the newly formed surface.…”
Section: Effects Of Surface Film Of the Fretted Surfacementioning
confidence: 99%