On the reaction of some arylalkoxychlorophosphines with acrylamide

Khairullin, V. K.; Vasyanina, M. A.; Pudovik, A. N.

doi:10.1007/bf00905369

Cited by 2 publications

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“…These bands are indicative of formation of a CN bond (Figure S3 in the Supporting Information). , It is therefore inferred that SC2 is probably transformed into a novel organic species containing a nitrile structure (−CN) coordinated to the central Cu atom. Beyond 723 K, the organic ligands are completely lost and a majority of the silanol groups come back (Figure i).…”

Section: Resultsmentioning

confidence: 99%

Deposition Chemistry of Cu[OCH(Me)CH₂NMe₂]₂ over Mesoporous Silica

et al. 2008

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The deposition of an organic copper precursor Cu[OCHMeCH2NMe2]2 on the surface of mesoporous silica MCM-41 dehydrated at 773 K was studied under high-vacuum conditions by infrared spectroscopy combined with elemental analysis, X-ray absorption spectroscopy (XAS), thermogravimetric analysis (TG), temperature-programmed decomposition (TPD), and X-ray photoelectron spectroscopy (XPS). It is revealed that the copper precursor is chemically adsorbed on the surface of MCM-41 to form a stable surface copper complex (SC1) coordinated with two framework oxygen atoms by ligand exchange at temperatures below 423 K. The surface copper complex is easily decomposed into Cu(I) and Cu(0) via a successive two-step pathway upon heating at temperatures beyond 423 K. IR and TPD results indicate that the first-step decomposition occurs at the temperature range from 423 to 523 K, where the surface complex SC1 loses one organic ligand and one methane molecule, leading to formation of a surface intermediate complex (SC2) with a Schiff base ligand. The second-step decomposition starts at 523 K, where the complex (SC2) is transformed to Cu(0) by losing the remanent organic ligand and undergoes a surface intermediate complex (SC3) to form Cu(I) oxide species by a consecutive loss of small molecules. The surface hydroxyl groups participate in the adsorption and reaction of the Cu precursor on the support MCM-41, which is a critical factor to controllable preparation of copper-containing MCM-41 catalysts. The mechanisms of thermolysis are suggested to be distinctly different from its MOCVD pathways reported in the literature.

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Section: Resultsmentioning

confidence: 99%

Deposition Chemistry of Cu[OCH(Me)CH₂NMe₂]₂ over Mesoporous Silica

et al. 2008

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The Synthesis of Functionalized Phosphinic and Phosphonic Acids and their Derivatives. Part A: Halo, Hydroxy, Epoxy, Mercapto, Carboxy and Oxo Functionalized Acids

Edmundson¹

2009

Patai's Chemistry of Functional Groups

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Introduction Halo‐Phosphonic and ‐Phosphinic Acids Hydroxy‐Phosphonic and ‐Phosphinic Acids Epoxy‐Phosphonic and ‐Phosphinic Acids Mercapto‐Phosphonic and ‐Phosphinic Acids Phosphonoyl‐ and Phosphinoyl‐Alkanoic Acids and their Derivatives Oxoalkyl‐Phosphonic and ‐Phosphinic Acids

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On the reaction of some arylalkoxychlorophosphines with acrylamide

Cited by 2 publications

References 0 publications

Deposition Chemistry of Cu[OCH(Me)CH₂NMe₂]₂ over Mesoporous Silica

Deposition Chemistry of Cu[OCH(Me)CH₂NMe₂]₂ over Mesoporous Silica

The Synthesis of Functionalized Phosphinic and Phosphonic Acids and their Derivatives. Part A: Halo, Hydroxy, Epoxy, Mercapto, Carboxy and Oxo Functionalized Acids

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On the reaction of some arylalkoxychlorophosphines with acrylamide

Cited by 2 publications

References 0 publications

Deposition Chemistry of Cu[OCH(Me)CH2NMe2]2 over Mesoporous Silica

Deposition Chemistry of Cu[OCH(Me)CH2NMe2]2 over Mesoporous Silica

The Synthesis of Functionalized Phosphinic and Phosphonic Acids and their Derivatives. Part A: Halo, Hydroxy, Epoxy, Mercapto, Carboxy and Oxo Functionalized Acids

Contact Info

Product

Resources

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Deposition Chemistry of Cu[OCH(Me)CH₂NMe₂]₂ over Mesoporous Silica

Deposition Chemistry of Cu[OCH(Me)CH₂NMe₂]₂ over Mesoporous Silica