1949
DOI: 10.1364/josa.39.000532
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On the Preparation of Hard Oxide Films with Precisely Controlled Thickness on Evaporated Aluminum Mirrors*

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Cited by 190 publications
(45 citation statements)
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“…It has been known that the anodization of Al in this electrolyte produces a dense oxide on the surface of anode whose thickness is nearly proportional to the applied voltage. 11 On unpatterned Al films, we found a relation 1.3 nm/V between the thichness of the oxidized layer and the anodization voltage (ϳ1.0 nm/V for the reduction of Al film thickness 11 ͒. We applied a dc anodization voltage V a between the cathode and the anode, while monitoring the current through the droplet I a .…”
mentioning
confidence: 94%
“…It has been known that the anodization of Al in this electrolyte produces a dense oxide on the surface of anode whose thickness is nearly proportional to the applied voltage. 11 On unpatterned Al films, we found a relation 1.3 nm/V between the thichness of the oxidized layer and the anodization voltage (ϳ1.0 nm/V for the reduction of Al film thickness 11 ͒. We applied a dc anodization voltage V a between the cathode and the anode, while monitoring the current through the droplet I a .…”
mentioning
confidence: 94%
“…The average field in such films is thus independent of the applied potential difference, neglecting any potential drops other than that across the barrier oxide, and for aluminum in aqueous ammonium tartrate is of the order of (13 A-V -1)-1 or 7.7 )< 108 V-cm -1 (29). This field represents a steady state in which a finite ionic flow through the barrier oxide occurs in equilibrium with the rate of dissolution of the barrier oxide at the oxide-electrolyte interface (16).…”
Section: Discussionmentioning
confidence: 99%
“…The functionality in the latter case is not established (16). The simplest explanation of I-laas's data (29) is that the field is homogeneous throughout the oxide and that transport processes other than a field-dependent diffusional flow are unimportant. In such a model the ionic contribution to the terminal leakage current would necessarily be independent of the applied potential difference.…”
Section: Discussionmentioning
confidence: 99%
“…where ;1 =ion current (plate 1) ;2 = ion current (plate 2) e = the electronic charge I = radiant flux entering chamber example 1 X 10-10 A (C/s) IX 10-11 A 1.6 X 10-19 C (2) 101 where io=the emissive photocurrent from the photo diode I =the radiant flux incident on the photocathode E =the quantum efficiency (electrons/photon) of the photodiode k = the correction for monochromator gas absorption (in the ionization chamber mode) may be used to determine the quantum efficiency. Combining eqs (1) and (2) gives:…”
Section: Ionization Chamber Gong Wavelengths)mentioning
confidence: 99%