On the importance of ions and ion-molecule reactions to plasma-surface interface reactions

Comparison of pulsed and downstream deposition of fluorocarbon materials from C3F8 and c-C4F8 plasmas

“…18 This correlates to the XPS data, which show that materials deposited in C 4 F 8 plasmas are more crosslinked than those deposited in C 3 F 8 plasmas under the same conditions ͑Figs. PI-MS data show that CF 3 ϩ and CF ϩ are the predominant ions formed in C 3 F 8 and C 4 F 8 plasmas, respectively, indicating that the fragmentation of the original monomer is more extensive within the C 4 F 8 system.…”

“…Although our films have considerably higher F/C ratios, the ones deposited from pulsed C 3 F 8 plasmas at position B show good overall mechanical properties by the absence of delamination, even under stress ͓Fig. 3-4͒ that is typical of depositing C 4 F 8 plasmas 9 and the extensive fragmentation of the C 4 F 8 monomer seen in the C 4 F 8 PI-MS data 18 lend further support to the high fragmentation and ionization of the monomer in the plasma system. Additional applications for these materials include surface modification for biomaterials and the insulation of electrodes and scanning tunneling microscope tips.…”

“…12 For example, films with high F/C ratios and high CF 2 and CF 3 content are considered potential substrates for biomolecule immobilization in surface linked assays. 14,15,18 Pulsed plasmas and downstream depositions are common techniques for controlling film composition. 1,12,14 -17 The goal of this work is to examine and compare the structures of films deposited from C 3 F 8 and C 4 F 8 plasmas in both cw and pulsed systems, with the intent of optimizing the systems to produce high CF 2 and CF 3 content films.…”

Growth Mechanism of Oxygen-Containing Functional Plasma Polymers

“…[9] Moreover, synergistic effects of energetic particles (ions) and neutrals (radicals) as well as VUV radiation were reported. [10][11][12][13] The conditions under which plasma chemistry or plasma physics possibly dominate the growth (i.e. the mass deposition rate) of plasma polymers are controversially discussed in the literature since plasma polymer growth is always a competition between ablation and polymeriza-Regarding the recent debate on the usefulness of macroscopic kinetics for plasma polymerization, we further investigated the deposition of oxygen-containing functional plasma polymers based on low pressure CO 2 /C 2 H 4 RF discharges in order to find differences and transitions in the growth mechanism.…”

Correlating ion energies and CF2 surface production during fluorocarbon plasma processing of silicon

“…[12][13][14][15][16][17][18][19][20][21] These measurements demonstrated that the surface production of several molecules, including CF 2 , SiF 2 , CN, and SiCl 2 is enhanced by ion bombardment. [12][13][14][15][16][17][18][19][20][21] These measurements demonstrated that the surface production of several molecules, including CF 2 , SiF 2 , CN, and SiCl 2 is enhanced by ion bombardment.…”