On the development of texture during growth of magnetron-sputtered CrN

Schell, Norbert; Petersen, J.H.; Bøttiger, J.; Mücklich, A.; Chevallier, J.; Andreasen, K. Pagh; Eichhorn, F.

doi:10.1016/s0040-6090(02)01142-2

Cited by 42 publications

(25 citation statements)

References 13 publications

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“…The film grew in a well visible columnar manner. This type of layer growth is typical for magnetron-sputtered CrN films at a wide range of processing parameters, as reported previously [17]. This result is in a good agreement with reported results at [14].…”

Section: Results and Disscussionsupporting

confidence: 92%

Coating of Cr-V Ledeburitic Steel with CrN Containing 7% of Ag

Bílek¹,

Jurči²,

Hudáková³

et al. 2013

Research Papers Faculty of Materials Science and Technology Slovak University of Technology

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Section: Results and Disscussionsupporting

confidence: 92%

Coating of Cr-V Ledeburitic Steel with CrN Containing 7% of Ag

Bílek¹,

Jurči²,

Hudáková³

et al. 2013

Research Papers Faculty of Materials Science and Technology Slovak University of Technology

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“…21 Assuming no kinetic restriction and considering that S 002 ϽS 111 , and E 002 ϾE 111 , TiN films will grow with (002) grains at small thickness, where the surface term dominates, while (111) grains appear at larger thickness, where in turn the strain energy dominates. 22 Gautier and Machet 2 also reported that the (200) plane of CrN is the lowest surface energy plane, whereas (111) texture of CrN would be expected when the film thickness increased and the strain energy predominated. The critical film thickness, 220 nm, of CrN film was reported by Schell et al 22 However, the crossover of the orientation change of CrN films is not observed, although the film thickness reaches around 660 nm in this study.…”

Section: Pulse Frequency Effectmentioning

confidence: 96%

“…22 Gautier and Machet 2 also reported that the (200) plane of CrN is the lowest surface energy plane, whereas (111) texture of CrN would be expected when the film thickness increased and the strain energy predominated. The critical film thickness, 220 nm, of CrN film was reported by Schell et al 22 However, the crossover of the orientation change of CrN films is not observed, although the film thickness reaches around 660 nm in this study. It is argued that the energy mechanism does not play an important role to the texture change of CrN films in this study.…”

Section: Pulse Frequency Effectmentioning

confidence: 96%

The effects of substrate bias, substrate temperature, and pulse frequency on the microstructures of chromium nitride coatings deposited by pulsed direct current reactive magnetron sputtering

Lee

Tien

Kuo

2005

Journal of Elec Materi

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Recently, great attention has been devoted to the pulsed direct current (DC) reactive magnetron sputtering technique, due to its ability to reduce arcing and target poisoning, and its capability of producing insulating thin films. In this study, chromium nitride (CrN) coatings were deposited by the bipolar symmetric pulsed DC magnetron reactive sputtering process at different pulse frequency, substrate bias voltage, and the substrate temperature. It was observed that the texture of CrN changed from (111) to (200) as substrate temperature increased to 300°C as deposited at 2 kHz without substrate bias. With increasing pulsing bias and pulse frequency of target, predominated (200) orientation of CrN film was shown due to the ion bombardment/ channeling effect to preferentially sputter those unaligned planes. For the CrN coatings deposited with pulsed biasing, the grain size decreased with increasing pulse frequency and substrate bias, whereas the surface roughness showed a reverse trend. The deposition rate of the CrN films decreased with increasing pulse frequency. It was concluded that the pulse frequency, substrate bias, and substrate temperature played important role in the texture, microstructure, and surface roughness of the CrN coatings deposited by the pulsed DC magnetron sputtering process.

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“…It has been widely recognized that the composition, phase structure, texture, grain size and properties of nitride coatings are strong influenced by the reactive nitrogen gas content, the applied substrate bias and the substrate temperature [6][7][8][9][10][11] . Moreover, the grain structure and the crystallographic orientation of these coatings depend strongly on the deposition techniques [12] .…”

Section: Introductionmentioning

confidence: 99%

The effect of unbalanced coefficient of magnetron on the structure and properties of CN x coatings

Wen

Wang

et al. 2011

J. Wuhan Univ. Technol.-Mat. Sci. Edit.

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The effect of unbalanced coefficient of magnetron (UCM) on the structure and tribological properties of CrN x hard coatings was studied. The CrN x coatings were deposited on both Si wafer and hardened tool steel substrates using a closed-field unbalanced magnetron sputtering ion plating technique in a gas mixture of Ar＋N 2 under different unbalanced magnetron conditions. The coatings were characterized by means of XRD, XPS, SEM, microhardness tester and pin-on-disc tribometer to study respectively their structure, chemical bonding state, microstructure, hardness and tribological properties. The experimental results show that the UCM has a profound effect on the structure, hardness and tribological properties of the CrN x coatings. With increasing the values of UCM, the dominant phases in the deposited coatings evolved from Cr＋Cr 2 N to Cr 2 N＋CrN, the microstructure became denser and the hardness increased; in addition, reduced coefficient of friction and improved wear resistance of CrN x coatings were also observed under a larger UCM.

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On the development of texture during growth of magnetron-sputtered CrN

Cited by 42 publications

References 13 publications

Coating of Cr-V Ledeburitic Steel with CrN Containing 7% of Ag

Coating of Cr-V Ledeburitic Steel with CrN Containing 7% of Ag

The effects of substrate bias, substrate temperature, and pulse frequency on the microstructures of chromium nitride coatings deposited by pulsed direct current reactive magnetron sputtering

The effect of unbalanced coefficient of magnetron on the structure and properties of CN x coatings

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