A multi-photon absorption-based laser writing system with sub-micrometer resolution has been developed using an inexpensive sub-nanosecond laser for two-and three-dimensional structuring in photosensitive resist materials. New combinations of commercially available photoresists such as SU-8 and AR-N 4340, and a photoinitiator (2, 4, diethyl-9H-thioxanten-9-one) with large two-photon absorption at 532 nm are shown to be effective in obtaining sub-micrometer line or dot resolution. Systematic studies of the resolution on the system and fabrication parameters such as laser power, writing speed, focusing arrangement, etc. have been carried out. The sub-nanosecond-based laser micro writer is an inexpensive alternative with similar capabilities as a femtosecond-based laser writer. This system is comparably effective and has much higher capabilities for 2D structuring in terms of the aspect ratio of the fabricated structures than conventional 2D laser micro writers.Keywords: Fabrication parameters, photoresists, subnanosecond laser, two-photon polymerization, writing system. DURING the past few decades, several nano/micro fabrication techniques such as electron beam lithography (EBL), focused ion beam (FIB) milling and photolithography have been developed for the fabrication of simple as well as complex nano/microstructures 1 . Conventional laser writing and FIB milling have been only partially successful for fabrication of 3D micro/nanostructures. The need for vacuum using EBL and FIB methods can be disadvantageous. Micro-stereo lithography is an alternative method for 3D micro fabrication 2 , but has its limitations in terms of spatial resolution and writing speed. Multiphoton lithography can be highly advantageous over other techniques due to the localized nature of polymerization that can be employed for fabrication of highly complex 3D microstructures with spatial resolution far smaller than 100 nm using tightly focused beams beyond the diffraction limit 3,4 . This technique has found numerous applications in the fields of plasmonics 5 , memory devices 6 , photonic devices 7 , microelectromechanical systems (MEMS) 8 and chemical and biosensors 9 . Much of multi-photon laser writing has been carried out using titanium: sapphire femtosecond lasers operating at 780 nm wavelength. Although the ultrashort pulses are efficient for multi-photon polymerization, they are associated with high equipment cost. This can be offset by picosecond or sub-nanosecond lasers and using photointiators with large two-photon absorption cross-sections to obtain sub-wavelength resolution. He et al. 10 have reported a series of multi-photon absorbing materials that can be used for multi-photon polymerization using picosecond and sub-nanosecond lasers. Chung et al.11 have reported 3D micro-structuring using a low-cost Q-switched Nd : YAG microlaser. Other groups have utilized hybrid organic-inorganic resist such as SZ2080 (ORMOSIL) for the fabrication of high-resolution structures with picosecond lasers. Also, 2,4-diethyl-9H-thioxanten-9-one...