Abstract:In this study, the energy flux of sputtered atoms on a substrate was correlated to the properties of titanium nitride (TiN) films deposited using direct current magnetron sputtering (dcMS) un-der mixed Ar and N2 atmospheres. The neutral titanium sputtered atoms velocity distribution functions (AVDFs) were measured by tunable diode-laser induced fluorescence (TD-LIF), and the flux of particles and their energy were derived. Mass spectrometry was used to character-ize the energy-resolved flux of the ions. It wa… Show more
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