On the calculation of spreading resistance correction factors

Choo, S.C.; Leong, M.S.; Kuan, K.L.

doi:10.1016/0038-1101(76)90053-8

Cited by 48 publications

(48 citation statements)

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“…The development of the recursion relation by Koefoed [ 101 and its use by Choo et al [9] provided a major breakthrough in the evaluation of (9) and effectively removed the numerical difficulty associated with matrix inversion. The philosophy and utility of a recursion relation is that the kernel function, AN(A), for an N-layer structure can be easily generated from the kernel of an ( N -1)-layer structure by means of an algebraic relation.…”

Section: ( T mentioning

confidence: 99%

“…This limitation coupled with difficulties involved in the evaluation of the accompanying oscillatory integrals served to severly limit the applicability of the technique. However, a major advance came with the introduction of a recursion relation by Choo [9] for the construction of the solution of the N-layer problem from the solution of the ( N -1)-layer problem. The recursion relation had previously been introduced in geophysical literature [lo], [ 1 I].…”

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An exact recursion relation solution for the steady-state surface temperature of a general multilayer structure

Albers

1995

IEEE Trans. Comp., Packag., Manufact. Technol. A

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confidence: 99%

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confidence: 99%

An exact recursion relation solution for the steady-state surface temperature of a general multilayer structure

Albers

1995

IEEE Trans. Comp., Packag., Manufact. Technol. A

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“…1 and deposition time was set to obtain a film thickness equal to 15 pin in each case. Resistivity profiles were measured by means of the spreading resistance technique, corrected according to [5] and recalculated to nornialized concentration profiles [GI. It can be seen that passing over the transition curve results in a still higher concentration gradient.…”

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confidence: 99%

Optimum growth conditions in silicon vapour epitaxy

Borkowicz¹,

Korec²,

Nossarzewska-Orłowska³

1978

Phys. Stat. Sol. (a)

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“…The implementation of this technique has been greatly simplified by the recursion relation for the kernel of the correction factor integral as developed by Choo et al (4). The first successful use of this method has been presented by D'Avanzo et at.…”

Section: Jo(~s) ~ Iv(~a)ad~ [2]mentioning

confidence: 98%

“…[4] and [7]. In particular, if these are adequate descriptions of the conduction processes in these two extreme cases, then their validity should be easily checked in the cases of uniform layers over insulating or conducting boundaries.…”

Section: Calculationsmentioning

confidence: 98%

The Relation Between the Correction Factor and the Local Slope in Spreading Resistance

Albers

1983

J. Electrochem. Soc.

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Dickey had proposed a technique, known as the local slope method, for the calculation of the correction factor which is used to obtain resistivity profiles from spreading resistance data. The technique is founded upon two asymptotic models for the conduction process involved in the spreading resistance measurement for the cases of (i) a conducting layer over an insulating substrate, and (ii) a high resistivity layer over a low resistivity or conducting substrate. The results of these two extreme cases are bridged by means of an assumed functional relation between the correction factor and the local slope of the spreading resistance data. This paper examines the two asymptotic models as well as the assumed functional relation between the correction factor and the local slope. It is shown that the asymptotic models adequately describe the behavior of the correction factor for a thin uniform layer over insulating or conducting boundaries. In addition, the single-valued relation between the correction factor and the local slope, which is assumed by the local slope methqd, is shown not to be an adequate representation of the multiple-valued relation between these two quantities found from multilayer data. For the cases considered, this distinction leads to an error in the resistivities as interpreted by the local slope method by as much as 60%. Nonetheless, the local slope res_ults qualitatively follow the multilayer results thus making the technique a usable one for the calculation of approximate correction factors. A comparison of the two correction factor vs. local slope relations provides a basis for the behavior of the interpreted resistivities when they are compared with the input resistivities.

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On the calculation of spreading resistance correction factors

Cited by 48 publications

References 3 publications

An exact recursion relation solution for the steady-state surface temperature of a general multilayer structure

An exact recursion relation solution for the steady-state surface temperature of a general multilayer structure

Optimum growth conditions in silicon vapour epitaxy

The Relation Between the Correction Factor and the Local Slope in Spreading Resistance

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