1997
DOI: 10.1007/s11661-997-0062-1
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On the blister formation in copper alloys due to the helium ion implantation

Abstract: A new approach to the blister-formation phenomenon is discussed by means of the mathematical solution on a uniformly loaded circular plate with clamped edges (circular diaphragm). In the present investigation, it was found that blister formation depends on the mechanical properties of the alloys and the near-surface concentration of the implanted gas, which itself is contingent on the crystallographic orientation by means of the stopping power of the implanted atoms. The reported model is based on the fact tha… Show more

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Cited by 2 publications
(1 citation statement)
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“…The concentration profile of 250 keV energy would be different from those of the 150 keV energy H + ions like that of He in copper (Moreno and Eliezer 1997). It is well established that while the depth of penetration increases with energy of implantation, the concentration of implanted gas decreases with increase in energy of the projectile.…”
Section: Vacuum Annealing Of Implanted Sample and Development Of Macrmentioning
confidence: 99%
“…The concentration profile of 250 keV energy would be different from those of the 150 keV energy H + ions like that of He in copper (Moreno and Eliezer 1997). It is well established that while the depth of penetration increases with energy of implantation, the concentration of implanted gas decreases with increase in energy of the projectile.…”
Section: Vacuum Annealing Of Implanted Sample and Development Of Macrmentioning
confidence: 99%