2019
DOI: 10.1063/1.5107493
|View full text |Cite
|
Sign up to set email alerts
|

On the angular dependence of InP high electron mobility transistors for cryogenic low noise amplifiers in a magnetic field

Abstract: The InGaAs-InAlAs-InP high electron mobility transistor (InP HEMT) is the preferred active device used in a cryogenic low noise amplifier (LNA) for sensitive detection of microwave signals. We observed that an InP HEMT 0.3-14 GHz LNA at 2 K, where the in-going transistors were oriented perpendicular to a magnetic field, heavily degraded in gain and average noise temperature already up to 1.5 T. Dc measurements for InP HEMTs at 2 K revealed a strong reduction in the transistor output current as a function of st… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
7
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
5
2

Relationship

1
6

Authors

Journals

citations
Cited by 9 publications
(8 citation statements)
references
References 10 publications
(13 reference statements)
0
7
0
Order By: Relevance
“…It can also be seen from Fig. 1 (a), that the drain current decreases with the magnetic field, apparently, due to the GMR effect [13].…”
Section: Index Terms-ingaas/inp Hemt Low-field Mobility Highfield Velocity Geometrical Magnetoresistance Charge Carrier Transportmentioning
confidence: 60%
See 1 more Smart Citation
“…It can also be seen from Fig. 1 (a), that the drain current decreases with the magnetic field, apparently, due to the GMR effect [13].…”
Section: Index Terms-ingaas/inp Hemt Low-field Mobility Highfield Velocity Geometrical Magnetoresistance Charge Carrier Transportmentioning
confidence: 60%
“…where q is the elementary charge and Cg = × 0 d is the gate capacitance per unit area, where d = 14 nm and ≈ 13 are the total thickness and the effective dielectric constant of the barrier and spacer layers, and 0 the dielectric constant for vacuum [13], [14], [29].…”
Section: Index Terms-ingaas/inp Hemt Low-field Mobility Highfield Velocity Geometrical Magnetoresistance Charge Carrier Transportmentioning
confidence: 99%
“…where q is the elementary charge and C g = ϵ×ϵ0 d is the gate capacitance per unit area, where d = 14 nm and ϵ ≈ 13 are the total thickness and the effective dielectric constant of the barrier and spacer layers, and ϵ 0 the dielectric constant for vacuum [18,33].…”
Section: Resultsmentioning
confidence: 99%
“…We deliberately selected HEMTs having a relatively large gate length with the goal to minimize quasi-ballistic transport effects by keeping the gate longer than the mean free path of the charge carriers, which one can consider as a limitation of the work [16,17]. The devices were fabricated using a conventional top-down approach, planar lithography and wet etching of an InGaAs/InP based heterostructure [18]. These type of HEMTs reveal excellent noise performance with minimum noise temperature down to 1 K [19].…”
Section: Fabrication and Measurement Methodsmentioning
confidence: 99%
“…The drain current tends to saturate in the whole range of gate voltages. The drain current also decreases with the magnetic field, due to the GMR effect [13].…”
Section: Resultsmentioning
confidence: 99%