Off-specular reflectivity study of sputter-deposition of platinum during growth

Huh, You; Huang, Keqing; Kampwirth, R. T.

doi:10.1016/0921-4526(95)00908-6

Cited by 15 publications

(2 citation statements)

References 7 publications

(3 reference statements)

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“…At this temperature the satellite peaks are not observable when the azimuthal angle of the sample is rotated by 90°͑i.e., incident wave vector parallel to ͗1 Ϫ1 0͒͘. Since it is well known that for transverse scans at low vertical momentum, the observation of satellite peaks can be unambiguously associated to the average distance between surface features, 22 the present observation indicates the formation of ripples along the ͗0 0 1͘ direction whose wavelength evolves in time. From the position of the two peaks, it is possible to calculate the ripple period ϭ2/q p where q p is the distance of the center of the satellite from the diffraction peak.…”

supporting

confidence: 62%

In situx-ray scattering study of Ag(110) nanostructuring by ion erosion

et al. 2002

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The time evolution of the morphology of the Ag͑110͒ surface during ion sputtering has been studied in situ and in real time by x-ray based techniques. The surface was bombarded with Ar ϩ ions at an energy of 1 keV in the temperature range 100-320 K. Grazing-incidence x-ray scattering measurements have been carried out in order to characterize the shape and the time evolution of the regular structures ͑mounds or ripples͒ created on the surface. The results show that the periodicity ͑i.e., the average separation between features͒ increases as function of the sputtering time, following a power-law behavior. Moreover, the slope of the mounds/ripples depends on temperature, ranging between 6 and 12°if measured along the ͗1 Ϫ1 0͘ direction and between 8 and 10°along ͗0 0 1͘.

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confidence: 62%

In situx-ray scattering study of Ag(110) nanostructuring by ion erosion

et al. 2002

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“…With the GIXR technique, You et al 13,14 and Lee and Tseng 15 have studied the growth of Pt/Si͑111͒ and Al/ Si͑100͒ at room temperature during the sputtering and electron beam evaporation process. Their results have indicated that the Pt thin film shows an island growth on the Si substrate in the initial stage.…”

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confidence: 99%

Surface morphological modification of Pt thin films induced by growth temperature

Wei

Fujimoto

et al. 1998

Phys. Rev. B

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A magnetron sputter deposition chamber for in‐situ investigation of multilayer film growth using a state of the art Laboratory Diffractometer

Ringpfeil¹,

Lützenkirchen‐Hecht²,

Frahm³

2007

Physica Status Solidi (a)

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An Fe2O3–Al2O3 bilayer film was prepared on a Si(111)‐wafer by sputter deposition in a vacuum chamber with two integrated small magnetron sources and in‐situ investigated using grazing incidence X‐ray reflectivity, X‐ray scattering and X‐ray diffraction experiments. We will present details of the new cell and present first results of the prepared Fe2O3–Al2O3 thin films, which exhibit an amorphous film structure with a reduced density and a roughness increasing with film thickness. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Off-specular reflectivity study of sputter-deposition of platinum during growth

Cited by 15 publications

References 7 publications

In situx-ray scattering study of Ag(110) nanostructuring by ion erosion

In situx-ray scattering study of Ag(110) nanostructuring by ion erosion

Surface morphological modification of Pt thin films induced by growth temperature

A magnetron sputter deposition chamber for in‐situ investigation of multilayer film growth using a state of the art Laboratory Diffractometer

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