Obtaining Atomically Smooth 4H–SiC (0001) Surface by Controlling Balance Between Anodizing and Polishing in Electrochemical Mechanical Polishing

Yang, Xu; Yang, Xiaozhe; Sun, Rongyan; Kawai, Kentaro; Arima, Kenta; Yamamura, Kazuya

doi:10.1007/s41871-019-00043-5

Cited by 27 publications

(9 citation statements)

References 19 publications

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“…Ultra-smooth surface processing can be realized by utilising mechanical [1], electrochemical mechanical [2], dry chemical process [3], or by energy beam [4] technology. Previous plasma figuring of silicon based optical surfaces has been undertaken using a radio frequency plasma jet at atmospheric pressure.…”

Section: Introductionmentioning

confidence: 99%

Characterisation of a microwave induced plasma torch for glass surface modification

Bennett

Castelli

et al. 2020

Front. Mech. Eng.

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Microwave induced plasma torches find wide applications in material and chemical analysis. Investigation of a coaxial electrode microwave induced plasma (CE-MIP) torch is conducted in this study, making it available for glass surface modification and polishing. A dedicated nozzle is designed to inject secondary gases into the main plasma jet. This study details the adaptation of a characterisation process for CE-MIP technology. Microwave spectrum analysis is used to create a polar plot of the microwave energy being emitted from the coaxial electrode, where the microwave energy couples with the gas to generate the plasma jet. Optical emission spectroscopy analysis is also employed to create spatial maps of the photonic intensity distribution within the plasma jet when different additional gases are injected into it. The CE-MIP torch is experimentally tested for surface energy modification on glass where it creates a super-hydrophilic surface.

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Section: Introductionmentioning

confidence: 99%

Characterisation of a microwave induced plasma torch for glass surface modification

Bennett

Castelli

et al. 2020

Front. Mech. Eng.

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“…Yang [51] studied the effect of the balance between the anodic oxidation rate and the oxide removal rate on the polishing performance of 4H-SiC ECMP by the ceria grinding stone. It was found that with the increase in the oxide layer, the interface between SiC and the oxide layer became rough, which led to the increase in SiC surface roughness after ECMP.…”

Section: Electrochemical Mechanical Polishing (Ecmp)mentioning

confidence: 99%

A Review on Precision Polishing Technology of Single-Crystal SiC

Liu

et al. 2022

Crystals

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Single-crystal SiC is a typical third-generation semiconductor power-device material because of its excellent electronic and thermal properties. An ultrasmooth surface with atomic surface roughness that is scratch free and subsurface damage (SSD) free is indispensable before its application. As the last process to reduce the surface roughness and remove surface defects, precision polishing of single-crystal SiC is essential. In this paper, precision polishing technologies for 4H-SiC and 6H-SiC, which are the most commonly used polytypes of single-crystal SiC, such as chemical mechanical polishing (CMP), photocatalytic chemical mechanical polishing (PCMP), plasma-assisted polishing (PAP), electrochemical mechanical polishing (ECMP), and catalyst-referred etching (CARE), were reviewed and compared with emphasis on the experimental setup, polishing mechanism, material removal rate (MRR), and surface roughness. An atomically smooth surface without SSD can be obtained by CMP, PCMP, PAP, and CARE for single-crystal SiC. However, their MRRs are meager, and the waste treatment after CMP is difficult and expensive. Moreover, PAP’s operation is poor due to the complex polishing system, plasma generation, and irradiation devices. A high MRR can be achieved by ECMP. In addition, it is an environmentally friendly precision polishing process for single-crystal SiC since the neutral salt solution is generally used as the electrolyte in ECMP. However, the formation of the egglike protrusions at the oxide/SiC interface during anodic oxidation would lead to a bigger surface roughness after ECMP than that after PAP is processed. The HF solution used in CARE was toxic, and Pt was particularly expensive. Ultrasonic vibration-assisted single-crystal SiC polishing and electrolyte plasma polishing (EPP) were discussed; furthermore, the research direction of further improving the surface quality and MRR of single-crystal SiC was prospected.

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“…Electropolishing is an efficient polishing process for metal materials in concentrated electrolytes; it generates a damage-free surface because the material is removed through anodic dissolution [1][2][3]. Atomic and close-toatomic scale accuracy is possible with the electrochemical machining and electropolishing method because the material is removed atom by atom in the anodic dissolution [4][5][6].…”

Section: Introductionmentioning

confidence: 99%

Orientation effect of electropolishing characteristics of 316L stainless steel fabricated by laser powder bed fusion

Han

2021

Front. Mech. Eng.

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Abstract3D metal printing process has attracted increasing attention in recent years due to advantages, such as flexibility and rapid prototyping. This study aims to investigate the orientation effect of electropolishing characteristics on different surfaces of 316L stainless steel fabricated by laser powder bed fusion (L-PBF), considering that the rough surface of 3D printed parts is a key factor limiting its applications in the industry. The electropolishing characteristics on the different surfaces corresponding to the building orientation in selective laser melting are studied. Experimental results show that electrolyte temperature has critical importance on the electropolishing, especially for the vertical direction to the layering plane. The finish of electropolished surfaces is affected by the defects generated during L-PBF process. Thus, the electropolished vertical surface has higher surface roughness Sa than the horizontal surface. The X-ray photoelectron spectroscopy spectra show that the electropolished horizontal surface has higher Cr/Fe element ratio than the vertical surface. The electropolished horizontal surface presents higher corrosion resistance than the vertical surface by measuring the anodic polarization curves and fitting the equivalent circuit of experimental electrochemical impedance spectroscopy.

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Obtaining Atomically Smooth 4H–SiC (0001) Surface by Controlling Balance Between Anodizing and Polishing in Electrochemical Mechanical Polishing

Cited by 27 publications

References 19 publications

Characterisation of a microwave induced plasma torch for glass surface modification

Characterisation of a microwave induced plasma torch for glass surface modification

A Review on Precision Polishing Technology of Single-Crystal SiC

Orientation effect of electropolishing characteristics of 316L stainless steel fabricated by laser powder bed fusion

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