2016
DOI: 10.1186/s11671-016-1743-8
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Observation of Quantum Size Effect from Silicon Nanowall

Abstract: We developed a fabrication technique of very thin silicon nanowall structures. The minimum width of the fabricated silicon nanowall structures was about 3 nm. This thinnest region of the silicon nanowall structures was investigated by using cathode luminescence and ultraviolet photoelectron spectroscopy (UPS). The UPS measurements revealed that the density of states (DOS) of the thinnest region showed a stepwise shape which is completely different from that of the bulk Si. Theoretical analysis clearly demonstr… Show more

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Cited by 6 publications
(6 citation statements)
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“…Silicon (Si) nanostructures are the focus of extensive research activities seeking to circumvent the fundamental limitation set by the indirect bandgap of Si that hinders many potential applications, particularly in optoelectronics. A variety of Si nanostructures, such as porous Si, nanowalls, nanoholes, and nanowires (NWs) have achieved quantum confinement and increased optical absorption in Si [1,2,3,4]. The significant developments in Si nanostructuring demonstrated in recent years also indicate a gradual shift of focus from nanosize-related (quantum confinement) phenomena to surface/interface-related effects, including a variety of interactions with adsorbents, impurities, defects, etc.…”
Section: Introductionmentioning
confidence: 99%
“…Silicon (Si) nanostructures are the focus of extensive research activities seeking to circumvent the fundamental limitation set by the indirect bandgap of Si that hinders many potential applications, particularly in optoelectronics. A variety of Si nanostructures, such as porous Si, nanowalls, nanoholes, and nanowires (NWs) have achieved quantum confinement and increased optical absorption in Si [1,2,3,4]. The significant developments in Si nanostructuring demonstrated in recent years also indicate a gradual shift of focus from nanosize-related (quantum confinement) phenomena to surface/interface-related effects, including a variety of interactions with adsorbents, impurities, defects, etc.…”
Section: Introductionmentioning
confidence: 99%
“…As shown in Figure 14, this measured result agrees very well with a simulation described by Kanematsu et al in detail; the cross-sectional shape obtained from the TEM image was used in the simulation. 18 This indicates that the simulation is a useful tool, and the pitch and the height can be designed by the simulation to optimize for solar cells.…”
Section: Discussionmentioning
confidence: 99%
“…The specific resistance of silicon is almost independent of its thickness. Because in silicon, the quantum size effect occurs mainly at sizes less than 20 nm [48]. However, ZnO and CH 3 NH 3 PbI 3 have a quantum size effect at larger sizes.…”
Section: Impact Of Emitter Layer Thickness On Fill Factormentioning
confidence: 99%