Observation of nanocrystalline diamond in diamondlike carbon films deposited at room temperature in electron cyclotron resonance plasma

Zarrabian, M.; Fourches-Coulon, N.; Turban, G.; Marhic, C.; Lancin, M.

doi:10.1063/1.118912

Cited by 74 publications

(14 citation statements)

References 6 publications

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“…Lattice fringes clearly appeared in the enlargement of the left-hand side of the sample, as shown in Fig. 6 sizes of nanocrystalline diamond films previously reported by several authors [15,23,29,78], in which the grain sizes were found to be in the range 3-50 nm.…”

Section: Eels Mappingmentioning

confidence: 60%

“…While a microwave plasma is most commonly used for the PE-CVD of diamond films, ECR plasma is the only plasma used for diamond deposition at pressures below 1 Torr [27][28][29]. Bozeman et al [30] reported diamond deposition at 4 Torr using a planar ICP, and there are a few reports that describe the synthesis of diamond by lowpressure ICP.…”

Section: Low-pressure Pe-cvdmentioning

confidence: 99%

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Plasma-enhanced chemical vapor deposition of nanocrystalline diamond

Okada¹

2007

Science and Technology of Advanced Materials

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Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD) of nanocrystalline diamond and mainly focuses on the growth of nanocrystalline diamond by low-pressure PE-CVD. Nanocrystalline diamond particles of 200-700 nm diameter have been prepared in a 13.56 MHz low-pressure inductively coupled CH 4 /CO/H 2 plasma. The bonding state of carbon atoms was investigated by ultraviolet-excited Raman spectroscopy. Electron energy loss spectroscopy identified sp 2 -bonded carbons around the 20-50 nm subgrains of nanocrystalline diamond particles. Plasma diagnostics using a Langmuir probe and the comparison with plasma simulation are also reviewed. The electron energy distribution functions are discussed by considering different inelastic interaction channels between electrons and heavy particles in a molecular CH 4 /H 2 plasma. r

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Section: Eels Mappingmentioning

confidence: 60%

Section: Low-pressure Pe-cvdmentioning

confidence: 99%

Plasma-enhanced chemical vapor deposition of nanocrystalline diamond

Okada¹

2007

Science and Technology of Advanced Materials

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“…For microwave plasma deposition technology, electron cyclotron resonance plasma could deposit diamond films at pressure of some hundredths to thousandths torr. Zarrabian et al concluded that they observed NCD film with pressure of 2.7 mTorr [2]. Kouzuma et al also reported diamond film could be deposited at pressure of 1 mTorr [3].…”

Section: After William G E Synthesized Diamond By Chemical Vapor Dementioning

confidence: 95%

Nanocrystalline Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition and Its Biocompatible Property

Yang¹,

Zhang²

2018

AMPC

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Due to its unique properties such as high hardness, light transmittance, thermal conductance, chemical stability and corrosion resistance, diamond has drawn tremendous attention in last two decades. These specific properties made diamond film a promising material for cutting tools, microwave windows, heat sinks for electronic devices and diamond electrodes. However, the diamond film with grain sizes at microscale usually exhibits high surface roughness and hinders its applications in the microelectro mechanical system (MEMS) and biological field because it is difficult to be polished by mechanical and chemical methods. With the development of the chemical vapor deposition, the nanocrystalline diamond (NCD) film has been fabricated and found new applications. The grain size of NCD film is in the range of 10 to 100 nm, which inherits the properties of the diamond and possesses the unique properties of the nanoscale materials, and the morphology of the NCD film is granular or needle-like structure. The microwave plasma chemical vapor deposition (MPCVD) has been regarded as the most promising method to deposit NCD film at low temperature. Compared to the hot filament CVD, MPCVD can grow high quality NCD film avoiding of the contamination from the filament materials. The MPCVD technique has high plasma density to activate carbonaceous compound and grow NCD film in high growth rate and low substrate temperature. The unique properties of NCD film, such as the superior electrical, mechanical and biological properties facilitate their application in various fields. The biological application, especially as a biocompatible coating, mainly includes the joint replacement implants and protective coatings and the ophthalmological prosthesis.

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“…These films can be deposited at lower temperatures compared to diamond. Recent work shows that if electron cyclotron resonance plasma is used, DLC films obtained at room temperature can contain nanocrystalline cubic or hexagonal diamond [19]. Amorphous DLC (a-C:H) films can be crystallized by laser treatment producing a mixture of diamond nanocrystals of 2-7 nm in size and graphite particles of 2-4 nm in size.…”

Section: Nanocrystalline Diamond and Dlc Filmsmentioning

confidence: 99%

Nanostructured Carbon Coatings

Gogotsi

2000

Nanostructured Films and Coatings

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This paper provides an overview of nanocrystalline and nanostructured carbon coatings and explores a very broad range of potentially important carbon nanostructures that may be used in future technologies. A new method for the synthesis of nanostructured carbon coatings on the surface of SiC and other metal carbides is described. This method is accomplished through the extraction of metals from carbides by supercritical water or halogens in a high temperature reactor. This is a versatile technology because a variety of carbon structures can be obtained on the surface of carbides in the same reactor. Not only simple shapes or fibers, but also powders, whiskers and components with complex shapes and surface morphologies can be coated. This technology allows for the control of coating growth on the atomic level, monolayer by monolayer, with high accuracy and controlled structures.Ordered and disordered graphite, nanoporous carbon (specific surface area of 1000 m 2 /g and more) and hard carbon can be formed depending on the temperature and gas composition. These carbon coatings can be used as tribological coatings having a lowfriction coefficient for a variety of applications, from heavy-load bearings to nanocoatings for MEMS; protective coating for sensors and tools, intermediate thin films for further CVD deposition of diamond, weak coatings on SiC reinforcements for composite materials, coatings on SiC powders for improved sinterability, catalyst supports, molecular membranes for sensors, etc. The structure and properties of carbon coatings obtained on the surface of SiC have been investigated using an array of analytical techniques.

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Observation of nanocrystalline diamond in diamondlike carbon films deposited at room temperature in electron cyclotron resonance plasma

Cited by 74 publications

References 6 publications

Plasma-enhanced chemical vapor deposition of nanocrystalline diamond

Plasma-enhanced chemical vapor deposition of nanocrystalline diamond

Nanocrystalline Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition and Its Biocompatible Property

Nanostructured Carbon Coatings

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